- 专利标题: Compound, resin, resist composition and method for producing resist pattern
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申请号: US17332216申请日: 2021-05-27
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公开(公告)号: US11822244B2公开(公告)日: 2023-11-21
- 发明人: Tatsuro Masuyama , Takuya Nakagawa , Koji Ichikawa
- 申请人: SUMITOMO CHEMICAL COMPANY, LIMITED
- 申请人地址: JP Tokyo
- 专利权人: SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人: SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人地址: JP Tokyo
- 代理机构: BUCHANAN INGERSOLL & ROONEY PC
- 优先权: JP 20095363 2020.06.01
- 主分类号: G03F7/039
- IPC分类号: G03F7/039 ; C08F220/30 ; C07C69/54 ; G03F7/004 ; G03F7/038
摘要:
Disclosed are a compound represented by formula (I), a resin and a resist composition:
wherein R1 represents an alkyl group having 1 to 6 carbon atoms which may have a halogen, hydrogen or halogen atom, R2 and R3 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms, R4 represents a fluorine atom, an alkyl fluoride group having 1 to 6 carbon atoms or an alkyl group having 1 to 12 carbon atoms, and —CH2— included in the alkyl fluoride group and the alkyl group may be replaced by —O— or —CO—, R5 represents a hydrogen atom, an alkylcarbonyl group having 2 to 6 carbon atoms or an acid-labile group, m2 represents an integer of 1 to 4, m4 represents an integer of 0 to 3, and m5 represents 1 or 2, in which 2≤m2+m4+m5≤5.
wherein R1 represents an alkyl group having 1 to 6 carbon atoms which may have a halogen, hydrogen or halogen atom, R2 and R3 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms, R4 represents a fluorine atom, an alkyl fluoride group having 1 to 6 carbon atoms or an alkyl group having 1 to 12 carbon atoms, and —CH2— included in the alkyl fluoride group and the alkyl group may be replaced by —O— or —CO—, R5 represents a hydrogen atom, an alkylcarbonyl group having 2 to 6 carbon atoms or an acid-labile group, m2 represents an integer of 1 to 4, m4 represents an integer of 0 to 3, and m5 represents 1 or 2, in which 2≤m2+m4+m5≤5.
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