发明授权
- 专利标题： Apparatus and method of substrate edge cleaning and substrate carrier head gap cleaning
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申请号： US17091105申请日： 2020-11-06
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公开(公告)号： US11823916B2公开(公告)日： 2023-11-21
- 发明人: Wei Lu , Jimin Zhang , Jianshe Tang , Brian J. Brown
- 申请人： Applied Materials, Inc.
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： PATTERSON & SHERIDAN, LLP
- 代理商 Marcus Hammack
- 主分类号： H01L21/67
- IPC分类号： H01L21/67 ; H01L21/02 ; H01L21/687
摘要：
The present disclosure relates to load cups that include an annular substrate station configured to receive a substrate. The annular substrate station surrounds a nebulizer located within the load cup. The nebulizer includes a set of energized fluid nozzles disposed on an upper surface of the nebulizer adjacent to an interface between the annular substrate station and the nebulizer. The set of energized fluid nozzles are configured to release energized fluid at an upward angle relative to the upper surface.
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