- 专利标题: Devices and methods related to switch linearization by compensation of a field-effect transistor
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申请号: US17543695申请日: 2021-12-06
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公开(公告)号: US11855361B2公开(公告)日: 2023-12-26
- 发明人: Zhiyang Liu , Nuttapong Srirattana
- 申请人: SKYWORKS SOLUTIONS, INC.
- 申请人地址: US CA Irvine
- 专利权人: Skyworks Solutions, Inc.
- 当前专利权人: Skyworks Solutions, Inc.
- 当前专利权人地址: US CA Irvine
- 代理机构: Chang & Hale LLP
- 主分类号: H03K17/687
- IPC分类号: H03K17/687 ; H03K17/567 ; H03K17/693 ; H03K17/14 ; H03K17/74 ; H01Q3/24 ; H04B1/00 ; H04B1/48
摘要:
A method for fabricating a semiconductor die is provided. The method can include providing a semiconductor substrate, forming a set of field-effect transistors on the semiconductor substrate, each field-effect transistor in the set of field-effect transistors having a respective source, drain, gate, and body, forming a compensation circuit on the semiconductor substrate, and connecting the compensation circuit to the set of field-effect transistors in parallel, the compensation circuit configured to compensate a non-linearity effect generated by the set of field-effect transistors.
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