Invention Grant
- Patent Title: Polycrystalline chemical vapour deposition synthetic diamond material
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Application No.: US17055405Application Date: 2019-05-14
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Publication No.: US11873224B2Publication Date: 2024-01-16
- Inventor: Gruffudd Trefor Williams , Richard Stuart Balmer , Joseph Michael Dodson
- Applicant: ELEMENT SIX TECHNOLOGIES LIMITED
- Applicant Address: GB Didcot
- Assignee: Element Six Technologies Limited
- Current Assignee: Element Six Technologies Limited
- Current Assignee Address: GB Didcot
- Agency: Kilpatrick Townsend & Stockton LLP
- Priority: GB 07787 2018.05.14
- International Application: PCT/EP2019/062256 2019.05.14
- International Announcement: WO2019/219630A 2019.11.21
- Date entered country: 2020-11-13
- Main IPC: C01B32/26
- IPC: C01B32/26 ; C01B32/25 ; C23C16/27 ; C23C16/511 ; C23C16/52

Abstract:
A polycrystalline CVD synthetic diamond material is provided that has an average thermal conductivity at room temperature through a thickness of the polycrystalline CVD synthetic diamond material of between 1700 and 2400 Wm−1K−1, a thickness of at least 2.5 mm and a visible transmittance through the thickness of the polycrystalline CVD synthetic diamond of at least 25%. A wafer comprising the material is also provided, wherein at least 70% of a total area of the wafer has the properties of the polycrystalline CVD synthetic diamond material. A method for fabricating the wafer is also disclosed.
Public/Granted literature
- US20210206647A1 POLYCRYSTALLINE CHEMICAL VAPOUR DEPOSITION SYNTHETIC DIAMOND MATERIAL Public/Granted day:2021-07-08
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