Invention Grant
- Patent Title: Gas introduction structure and processing apparatus
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Application No.: US17472959Application Date: 2021-09-13
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Publication No.: US11885024B2Publication Date: 2024-01-30
- Inventor: Hiroki Iriuda , Reita Igarashi , Kuniyasu Sakashita
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Venjuris, P.C.
- Priority: JP 20156410 2020.09.17
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23C16/52 ; H01L21/67 ; H01L21/02

Abstract:
A gas introduction structure extends in a longitudinal direction of a processing container having a substantially cylindrical shape to supply gas into the processing container. The gas introduction structure includes an introduction section that partitions an introduction chamber, an ejection section that partitions a plurality of ejection chambers each including a plurality of gas holes through which the gas is ejected into the processing container, and a branch section that partitions a branch chamber connected to the introduction chamber. The branch chamber is branched to correspond to the number of ejection chambers in a tournament manner and connected to the ejection chambers.
Public/Granted literature
- US20220081775A1 GAS INTRODUCTION STRUCTURE AND PROCESSING APPARATUS Public/Granted day:2022-03-17
Information query
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