Invention Grant
- Patent Title: Methods for increasing the density of high-index nanoimprint lithography films
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Application No.: US17136959Application Date: 2020-12-29
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Publication No.: US11892771B2Publication Date: 2024-02-06
- Inventor: Andrew Ceballos , Rami Hourani , Kenichi Ohno , Yuriy Melnik , Amita Joshi
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan, LLP
- Main IPC: G03F7/00
- IPC: G03F7/00 ; H01L21/28 ; C23C16/04 ; C23C16/455 ; G03F7/20 ; B82Y10/00

Abstract:
Embodiments of the present disclosure generally relate to densified nanoimprint films and processes for making these densified nanoimprint films, as well as optical devices containing the densified nanoimprint films. In one or more embodiments, a densified nanoimprint film contains a base nanoimprint film and a metal oxide disposed on the base nanoimprint film and in between the nanoparticles. The base nanoimprint film contains nanoparticles, where the nanoparticles contain titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, hafnium oxide, chromium oxide, indium tin oxide, silicon nitride, or any combination thereof. The metal oxide contains aluminum oxide, titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, indium oxide, indium tin oxide, hafnium oxide, chromium oxide, scandium oxide, tin oxide, zinc oxide, yttrium oxide, praseodymium oxide, magnesium oxide, silicon oxide, silicon nitride, silicon oxynitride, or any combination thereof.
Public/Granted literature
- US20210325778A1 METHODS FOR INCREASING THE DENSITY OF HIGH-INDEX NANOIMPRINT LITHOGRAPHY FILMS Public/Granted day:2021-10-21
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