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公开(公告)号：US11976002B2
公开(公告)日：2024-05-07
申请号：US17141813
申请日：2021-01-05
Applicant: Applied Materials, Inc.
Inventor： Alexia Adilene Portillo Rivera , Andrew Ceballos , Kenichi Ohno , Rami Hourani , Karl J. Armstrong , Brian Alexander Cohen
CPC classification number: C03C17/3615 , C03C17/3626 , C03C17/3642 , C03C17/3644 , C03C17/3663 , C23C14/0652 , C23C14/08 , C23C14/18 , C23C14/3407 , C03C2218/154
Abstract: Embodiments of the present disclosure generally relate to encapsulated optical devices and methods for fabricating the encapsulated optical devices. In one or more embodiments, a method for encapsulating an optical device includes depositing a metallic silver layer on a substrate, depositing a barrier layer on the metallic silver layer, where the barrier layer contains silicon nitride, a metallic element, a metal nitride, or any combination thereof, and depositing an encapsulation layer containing silicon oxide on the barrier layer.
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公开(公告)号：US12242186B2
公开(公告)日：2025-03-04
申请号：US18394133
申请日：2023-12-22
Applicant: Applied Materials, Inc.
Inventor： Andrew Ceballos , Rami Hourani , Kenichi Ohno , Yuriy Melnik , Amita Joshi
Abstract: Embodiments of the present disclosure generally relate to densified nanoimprint films and processes for making these densified nanoimprint films, as well as optical devices containing the densified nanoimprint films. In one or more embodiments, a densified nanoimprint film contains a base nanoimprint film and a metal oxide disposed on the base nanoimprint film and in between the nanoparticles. The base nanoimprint film contains nanoparticles, where the nanoparticles contain titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, hafnium oxide, chromium oxide, indium tin oxide, silicon nitride, or any combination thereof. The metal oxide contains aluminum oxide, titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, indium oxide, indium tin oxide, hafnium oxide, chromium oxide, scandium oxide, tin oxide, zinc oxide, yttrium oxide, praseodymium oxide, magnesium oxide, silicon oxide, silicon nitride, silicon oxynitride, or any combination thereof.
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公开(公告)号：US11892771B2
公开(公告)日：2024-02-06
申请号：US17136959
申请日：2020-12-29
Applicant: Applied Materials, Inc.
Inventor： Andrew Ceballos , Rami Hourani , Kenichi Ohno , Yuriy Melnik , Amita Joshi
CPC classification number: G03F7/0002 , C23C16/045 , C23C16/45527 , C23C16/45553 , G03F7/0005 , G03F7/2004 , H01L21/28123 , B82Y10/00
Abstract: Embodiments of the present disclosure generally relate to densified nanoimprint films and processes for making these densified nanoimprint films, as well as optical devices containing the densified nanoimprint films. In one or more embodiments, a densified nanoimprint film contains a base nanoimprint film and a metal oxide disposed on the base nanoimprint film and in between the nanoparticles. The base nanoimprint film contains nanoparticles, where the nanoparticles contain titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, hafnium oxide, chromium oxide, indium tin oxide, silicon nitride, or any combination thereof. The metal oxide contains aluminum oxide, titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, indium oxide, indium tin oxide, hafnium oxide, chromium oxide, scandium oxide, tin oxide, zinc oxide, yttrium oxide, praseodymium oxide, magnesium oxide, silicon oxide, silicon nitride, silicon oxynitride, or any combination thereof.
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公开(公告)号：US11850621B2
公开(公告)日：2023-12-26
申请号：US17456410
申请日：2021-11-24
Applicant: Applied Materials, Inc.
Inventor： Kangkang Wang , Yaseer Arafath Ahamed , Yige Gao , Benjamin B. Riordon , Rami Hourani , James D. Strassner , Ludovic Godet , Thinh Nguyen
Abstract: An optical device coating assembly is provided. The optical device coating assembly includes a substrate support operable to retain an optical device substrate. The coating assembly further includes a first actuator connected to the substrate support. The first actuator is configured to rotate the substrate support. The coating assembly includes a holder configured to hold a coating applicator against an edge of the optical device substrate when the optical device substrate is rotated on the substrate support and a second actuator operable to apply a force on the holder in a direction towards the substrate support. The second actuator is a constant force actuator.
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公开(公告)号：US12249489B2
公开(公告)日：2025-03-11
申请号：US18131997
申请日：2023-04-07
Applicant: Applied Materials, Inc.
Inventor： Yue Chen , Jinyu Lu , Yongmei Chen , Jinxin Fu , Zihao Yang , Mingwei Zhu , Takashi Kuratomi , Rami Hourani , Ludovic Godet , Qun Jing , Jingyi Yang , David Masayuki Ishikawa
Abstract: A method of processing an optical device is provided, including: positioning an optical device on a substrate support in an interior volume of a process chamber, the optical device including an optical device substrate and a plurality of optical device structures formed over the optical device substrate, each optical device structure including a bulk region formed of silicon carbide and one or more surface regions formed of silicon oxycarbide. The method further includes providing one or more process gases to the interior volume of the process chamber, and generating a plasma of the one or more process gases in the interior volume for a first time period when the optical device is on the substrate support, and stopping the plasma after the first time period. A carbon content of the one or more surface regions of each optical device structure is reduced by at least 50% by the plasma.
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Patent Agency Ranking
6.发明授权公开(公告)号：US12109641B2
公开(公告)日：2024-10-08
申请号：US17455288
申请日：2021-11-17
Applicant: Applied Materials, Inc.
Inventor： Kang Luo , Ludovic Godet , Daihua Zhang , Nai-Wen Pi , Jinrui Guo , Rami Hourani
CPC classification number: B23K10/00 , G02B6/0016 , G02B6/0036
Abstract: The present disclosure generally relates to a method and apparatus for forming a substrate having a graduated refractive index. A method of forming a waveguide structure includes expelling plasma from an applicator having a head toward a plurality of grating structures formed on a substrate. The plasma is formed in the head at atmospheric pressure. The method further includes changing a depth of the plurality of grating structures with the plasma by removing grating material from the plurality of grating structures.
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公开(公告)号：US11976351B2
公开(公告)日：2024-05-07
申请号：US17692465
申请日：2022-03-11
Applicant: Applied Materials, Inc.
Inventor： Kenichi Ohno , Andrew Ceballos , Karl J. Armstrong , Takashi Kuratomi , Rami Hourani , Ludovic Godet
CPC classification number: C23C14/083 , C03C17/2456 , C23C14/35 , C23C14/54 , G02B1/10 , G02B1/041
Abstract: An optical device is provided. The optical device includes an optical device substrate having a first surface; and an optical device film disposed over the first surface of the optical device substrate. The optical device film is formed of titanium oxide. The titanium oxide is selected from the group of titanium(IV) oxide (TiO2), titanium monoxide (TiO), dititanium trioxide (Ti2O3), Ti3O, Ti2O, δ-TiOx, where x is 0.68 to 0.75, and TinO2n-1, where n is 3 to 9, the optical device film has a refractive index greater than 2.72 at a 520 nanometer (nm) wavelength, and a rutile phase of the titanium oxide comprises greater than 94 percent of the optical device film.
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8.发明授权公开(公告)号：US11868043B2
公开(公告)日：2024-01-09
申请号：US17527819
申请日：2021-11-16
Applicant: Applied Materials, Inc.
Inventor： Amita Joshi , Andrew Ceballos , Kenichi Ohno , Rami Hourani , Ludovic Godet
CPC classification number: G03F7/0002 , C09D7/62 , C09D7/65 , C09D7/67 , G03F7/167
Abstract: Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition is provided and contains a plurality of passivated nanoparticles, one or more solvents, a surface ligand, an additive, and an acrylate. Each passivated nanoparticle contains a core and one or more shells, where the core contains one or more metal oxides and the shell contains one or more passivation materials. The passivation material of the shell contains one or more atomic layer deposition (ALD) materials, one or more block copolymers, or one or more silicon-containing compounds.
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公开(公告)号：US12208637B2
公开(公告)日：2025-01-28
申请号：US18167682
申请日：2023-02-10
Applicant: Applied Materials, Inc.
Inventor： Yingdong Luo , Jinyu Lu , Takashi Kuratomi , Alexia Adilene Portillo Rivera , Xiaopei Deng , Zhengping Yao , Daihua Zhang , Rami Hourani , Ludovic Godet
Abstract: Embodiments of the present disclosure generally relate to optical devices. More specifically, embodiments described herein relate to optical devices and methods of manufacturing a patterned optical device film on an optical device substrate. According to certain embodiments, an inkjet deposition process is used to deposit a patterned inkjet coating layer on the optical device substrate. A deposition process may then be used to deposit an optical device material on the patterned inkjet coating and the optical device substrate. The patterned inkjet coating on the optical device substrate may then be washed with an appropriate detergent to lift-off the patterned inkjet coating layer from the optical device substrate to form the patterned optical device film.
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公开(公告)号：US12121925B2
公开(公告)日：2024-10-22
申请号：US18506799
申请日：2023-11-10
Applicant: Applied Materials, Inc.
Inventor： Kangkang Wang , Yaseer Arafath Ahamed , Yige Gao , Benjamin B. Riordon , Rami Hourani , James D. Strassner , Ludovic Godet , Thinh Nguyen
Abstract: An optical device coating assembly is provided. The optical device coating assembly includes a substrate support operable to retain an optical device substrate. The coating assembly further includes a first actuator connected to the substrate support. The first actuator is configured to rotate the substrate support. The coating assembly includes a holder configured to hold a coating applicator against an edge of the optical device substrate when the optical device substrate is rotated on the substrate support and a second actuator operable to apply a force on the holder in a direction towards the substrate support. The second actuator is a constant force actuator.
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