公开(公告)号：US11976351B2

公开(公告)日：2024-05-07

申请号：US17692465

申请日：2022-03-11

Applicant: Applied Materials, Inc.

Inventor： Kenichi Ohno ,  Andrew Ceballos ,  Karl J. Armstrong ,  Takashi Kuratomi ,  Rami Hourani ,  Ludovic Godet

IPC: G02B1/10 ,  C03C17/245 ,  C23C14/08 ,  C23C14/35 ,  C23C14/54 ,  G02B1/04

CPC classification number: C23C14/083 ,  C03C17/2456 ,  C23C14/35 ,  C23C14/54 ,  G02B1/10 ,  G02B1/041

Abstract: An optical device is provided. The optical device includes an optical device substrate having a first surface; and an optical device film disposed over the first surface of the optical device substrate. The optical device film is formed of titanium oxide. The titanium oxide is selected from the group of titanium(IV) oxide (TiO2), titanium monoxide (TiO), dititanium trioxide (Ti2O3), Ti3O, Ti2O, δ-TiOx, where x is 0.68 to 0.75, and TinO2n-1, where n is 3 to 9, the optical device film has a refractive index greater than 2.72 at a 520 nanometer (nm) wavelength, and a rutile phase of the titanium oxide comprises greater than 94 percent of the optical device film.

公开(公告)号：US11887818B2

公开(公告)日：2024-01-30

申请号：US17498231

申请日：2021-10-11

Applicant: Applied Materials, Inc.

Inventor： Tsutomu Tanaka ,  John C. Forster ,  Ran Liu ,  Kenichi Ohno ,  Ning Li ,  Mihaela Balseanu ,  Keiichi Tanaka ,  Li-Qun Xia

IPC: H01J37/32 ,  C23C16/50 ,  C23C16/455 ,  C23C16/458 ,  C23C16/34 ,  C23C16/40 ,  C23C16/52 ,  C23C16/505

CPC classification number: H01J37/32449 ,  C23C16/345 ,  C23C16/401 ,  C23C16/458 ,  C23C16/4554 ,  C23C16/4583 ,  C23C16/45544 ,  C23C16/45551 ,  C23C16/50 ,  C23C16/505 ,  C23C16/52 ,  H01J37/3244 ,  H01J37/32137 ,  H01J37/32183 ,  H01J37/32935 ,  H01J37/32082

Abstract: Apparatus and methods to control the phase of power sources for plasma process regions in a batch process chamber. A master exciter controls the phase of the power sources during the process sequence based on feedback from the match circuits of the respective plasma sources.

公开(公告)号：US11868043B2

公开(公告)日：2024-01-09

申请号：US17527819

申请日：2021-11-16

Applicant: Applied Materials, Inc.

Inventor： Amita Joshi ,  Andrew Ceballos ,  Kenichi Ohno ,  Rami Hourani ,  Ludovic Godet

IPC: C08K9/02 ,  G03F7/00 ,  C09D7/40 ,  C09D7/62 ,  G03F7/16 ,  C09D7/65

CPC classification number: G03F7/0002 ,  C09D7/62 ,  C09D7/65 ,  C09D7/67 ,  G03F7/167

Abstract: Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition is provided and contains a plurality of passivated nanoparticles, one or more solvents, a surface ligand, an additive, and an acrylate. Each passivated nanoparticle contains a core and one or more shells, where the core contains one or more metal oxides and the shell contains one or more passivation materials. The passivation material of the shell contains one or more atomic layer deposition (ALD) materials, one or more block copolymers, or one or more silicon-containing compounds.

公开(公告)号：US11158489B2

公开(公告)日：2021-10-26

申请号：US15805466

申请日：2017-11-07

Applicant: Applied Materials, Inc.

Inventor： Tsutomu Tanaka ,  John C. Forster ,  Ran Liu ,  Kenichi Ohno ,  Ning Li ,  Mihaela Balseanu ,  Keiichi Tanaka ,  Li-Qun Xia

IPC: H01J37/00 ,  H01J37/32 ,  C23C16/50 ,  C23C16/455 ,  C23C16/458 ,  C23C16/34 ,  C23C16/40 ,  C23C16/52 ,  C23C16/505

Abstract: Apparatus and methods to control the phase of power sources for plasma process regions in a batch process chamber. A master exciter controls the phase of the power sources during the process sequence based on feedback from the match circuits of the respective plasma sources.

公开(公告)号：US11081318B2

公开(公告)日：2021-08-03

申请号：US16220833

申请日：2018-12-14

Applicant: Applied Materials, Inc.

Inventor： Kenichi Ohno ,  Keiichi Tanaka ,  Li-Qun Xia ,  Tsutomu Tanaka ,  Dmitry A. Dzilno ,  Mario D. Silvetti ,  John C. Forster ,  Rakesh Ramadas ,  Mike Murtagh ,  Alexander V. Garachtchenko

IPC: H01L21/31 ,  H01J37/32 ,  C23C16/507 ,  C23C16/455 ,  C23C16/56

Abstract: Apparatus and methods for depositing and treating or etching a film are described. A batch processing chamber includes a plurality of processing regions with at least one plasma processing region. A low frequency bias generator is connected to a susceptor assembly to intermittently apply a low frequency bias to perform a directional treatment or etching the deposited film.

公开(公告)号：US12242186B2

公开(公告)日：2025-03-04

申请号：US18394133

申请日：2023-12-22

Applicant: Applied Materials, Inc.

Inventor： Andrew Ceballos ,  Rami Hourani ,  Kenichi Ohno ,  Yuriy Melnik ,  Amita Joshi

IPC: G03F7/00 ,  B82Y10/00 ,  C23C16/04 ,  C23C16/455 ,  G03F7/20 ,  H01L21/28

Abstract: Embodiments of the present disclosure generally relate to densified nanoimprint films and processes for making these densified nanoimprint films, as well as optical devices containing the densified nanoimprint films. In one or more embodiments, a densified nanoimprint film contains a base nanoimprint film and a metal oxide disposed on the base nanoimprint film and in between the nanoparticles. The base nanoimprint film contains nanoparticles, where the nanoparticles contain titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, hafnium oxide, chromium oxide, indium tin oxide, silicon nitride, or any combination thereof. The metal oxide contains aluminum oxide, titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, indium oxide, indium tin oxide, hafnium oxide, chromium oxide, scandium oxide, tin oxide, zinc oxide, yttrium oxide, praseodymium oxide, magnesium oxide, silicon oxide, silicon nitride, silicon oxynitride, or any combination thereof.

公开(公告)号：US11892771B2

公开(公告)日：2024-02-06

申请号：US17136959

申请日：2020-12-29

Applicant: Applied Materials, Inc.

Inventor： Andrew Ceballos ,  Rami Hourani ,  Kenichi Ohno ,  Yuriy Melnik ,  Amita Joshi

IPC: G03F7/00 ,  H01L21/28 ,  C23C16/04 ,  C23C16/455 ,  G03F7/20 ,  B82Y10/00

CPC classification number: G03F7/0002 ,  C23C16/045 ,  C23C16/45527 ,  C23C16/45553 ,  G03F7/0005 ,  G03F7/2004 ,  H01L21/28123 ,  B82Y10/00

Abstract: Embodiments of the present disclosure generally relate to densified nanoimprint films and processes for making these densified nanoimprint films, as well as optical devices containing the densified nanoimprint films. In one or more embodiments, a densified nanoimprint film contains a base nanoimprint film and a metal oxide disposed on the base nanoimprint film and in between the nanoparticles. The base nanoimprint film contains nanoparticles, where the nanoparticles contain titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, hafnium oxide, chromium oxide, indium tin oxide, silicon nitride, or any combination thereof. The metal oxide contains aluminum oxide, titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, indium oxide, indium tin oxide, hafnium oxide, chromium oxide, scandium oxide, tin oxide, zinc oxide, yttrium oxide, praseodymium oxide, magnesium oxide, silicon oxide, silicon nitride, silicon oxynitride, or any combination thereof.

公开(公告)号：US11739429B2

公开(公告)日：2023-08-29

申请号：US17339411

申请日：2021-06-04

Applicant: Applied Materials, Inc.

Inventor： Abhishek Mandal ,  Nitin Deepak ,  Neha Gupta ,  Prerna Sonthalia Goradia ,  Ankur Kadam ,  Kenichi Ohno ,  David Alexander Britz ,  Lance A. Scudder

IPC: C23C16/40 ,  C23G1/10 ,  C23C16/02 ,  C23C16/34 ,  B64F5/40 ,  C11D7/32 ,  C11D7/06 ,  C11D7/08 ,  C11D11/00

CPC classification number: C23G1/10 ,  B64F5/40 ,  C11D7/06 ,  C11D7/08 ,  C11D7/3245 ,  C11D11/0023 ,  C23C16/0227 ,  C23C16/34 ,  C23C16/40

Abstract: Methods for refurbishing aerospace components by removing corrosion and depositing protective coatings are provided herein. In one or more embodiments, a method of refurbishing an aerospace component includes exposing the aerospace component containing corrosion to an aqueous cleaning solution. The aerospace component contains a nickel superalloy, an aluminide layer disposed on the nickel superalloy, and an aluminum oxide layer disposed on the aluminide layer. The method includes removing the corrosion from a portion of the aluminum oxide layer with the aqueous cleaning solution to reveal the aluminum oxide layer, then exposing the aluminum oxide layer to a post-rinse, and forming a protective coating on the aluminum oxide layer.

公开(公告)号：US11732353B2

公开(公告)日：2023-08-22

申请号：US16850856

申请日：2020-04-16

Applicant: Applied Materials, Inc.

Inventor： Sukti Chatterjee ,  Lance A. Scudder ,  Yuriy Melnik ,  David A. Britz ,  Thomas Knisley ,  Kenichi Ohno ,  Pravin K. Narwankar

IPC: C23C16/40 ,  C23C16/455 ,  C23C28/02 ,  C23C16/56 ,  B64F5/40

CPC classification number: C23C16/403 ,  C23C16/405 ,  C23C16/45525 ,  C23C16/56 ,  C23C28/02 ,  B64F5/40

Abstract: Embodiments of the present disclosure generally relate to protective coatings on an aerospace component and methods for depositing the protective coatings. In one or more embodiments, a method for depositing a coating on an aerospace component includes depositing one or more layers on a surface of the aerospace component using an atomic layer deposition or chemical vapor deposition process, and performing a partial oxidation and annealing process to convert the one or more layers to a coalesced layer having a preferred phase crystalline assembly. During oxidation cycles, an aluminum depleted region is formed at the surface of the aerospace component, and an aluminum oxide region is formed between the aluminum depleted region and the coalesced layer. The coalesced layer forms a protective coating, which decreases the rate of aluminum depletion from the aerospace component and the rate of new aluminum oxide scale formation.

公开(公告)号：US11697879B2

公开(公告)日：2023-07-11

申请号：US16560838

申请日：2019-09-04

Applicant: Applied Materials, Inc.

Inventor： Sukti Chatterjee ,  Kenichi Ohno ,  Lance A. Scudder ,  Yuriy Melnik ,  David A. Britz ,  Pravin K. Narwankar ,  Thomas Knisley ,  Mark Saly ,  Jeffrey Anthis

IPC: C23C16/56 ,  C23C16/40 ,  C22C19/03

CPC classification number: C23C16/56 ,  C22C19/03 ,  C23C16/405

Abstract: Embodiments of the present disclosure generally relate to protective coatings on aerospace components and methods for depositing the protective coatings. In one or more embodiments, a method for producing a protective coating on an aerospace component includes depositing a metal oxide template layer on the aerospace component containing nickel and aluminum (e.g., nickel-aluminum superalloy) and heating the aerospace component containing the metal oxide template layer during a thermal process and/or an oxidation process. The thermal process and/or oxidation process includes diffusing aluminum contained within the aerospace component towards a surface of the aerospace component containing the metal oxide template layer, oxidizing the diffused aluminum to produce an aluminum oxide layer disposed between the aerospace component and the metal oxide template layer, and removing at least a portion of the metal oxide template layer while leaving the aluminum oxide layer.