Invention Grant
- Patent Title: Interlayer connective structure of wiring board and method of manufacturing the same
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Application No.: US17377280Application Date: 2021-07-15
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Publication No.: US11895772B2Publication Date: 2024-02-06
- Inventor: Chi-Min Chang , Ching-Sheng Chen , Jun-Rui Huang , Wei-Yu Liao , Yi-Pin Lin
- Applicant: Unimicron Technology Corp.
- Applicant Address: TW Taoyuan
- Assignee: Unimicron Technology Corp.
- Current Assignee: Unimicron Technology Corp.
- Current Assignee Address: TW Taoyuan
- Agency: CKC & Partners Co., LLC
- Priority: TW 0119894 2021.06.01
- Main IPC: H05K1/11
- IPC: H05K1/11 ; H05K3/42 ; H05K1/18

Abstract:
An interlayer connective structure is suitable for being formed in a wiring board, in which the wiring board includes two traces and an insulation part between the traces. The insulation part has a through hole. The interlayer connective structure located in the through hole is connected to the traces. The interlayer connective structure includes a column and a pair of protuberant parts. The protuberant parts are located at two ends of the through hole respectively and connected to the column and the traces. The protuberant parts stick out from the outer surfaces of the traces respectively. Each of the protuberant parts has a convex curved surface, in which the distance between the convex curved surface and the axis of the through hole is less than the radius of the through hole.
Public/Granted literature
- US20220386460A1 INTERLAYER CONNECTIVE STRUCTURE OF WIRING BOARD AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2022-12-01
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