- 专利标题: Gas management system
-
申请号: US16965461申请日: 2019-01-10
-
公开(公告)号: US11949203B2公开(公告)日: 2024-04-02
- 发明人: Yzzer Roman Gutierrez , Walter Dale Gillespie , Edward Siqi Luo , Dinesh Adinath Kanawade
- 申请人: Cymer, LLC
- 申请人地址: US CA San Diego
- 专利权人: Cymer, LLC
- 当前专利权人: Cymer, LLC
- 当前专利权人地址: US CA San Diego
- 代理机构: DiBerardino McGovern IP Group LLC
- 国际申请: PCT/US2019/012999 2019.01.10
- 国际公布: WO2019/160627A 2019.08.22
- 进入国家日期: 2020-07-28
- 主分类号: H01S3/00
- IPC分类号: H01S3/00 ; B01D53/04 ; B01D53/30 ; B01F23/10 ; B01F35/21 ; B01F35/221 ; G01N33/00 ; H01S3/036 ; H01S3/225
摘要:
A gas chamber supply system includes a gas source configured to fluidly connect to a gas chamber and to supply a gas mixture to the gas chamber, the gas source including: a pre-prepared gas supply including a gas mixture, the gas mixture including a plurality of gas components and lacking a halogen; a recycled gas supply including the gas mixture; and a fluid flow switch connected to the pre-prepared gas supply and to the recycled gas supply. The gas chamber supply also includes a control system configured to: determine if the relative concentration between the gas components within the recycled gas supply is within an acceptable range; and provide a signal to the fluid flow switch to thereby select one of the pre-prepared gas supply and the recycled gas supply to as the gas source based on the determination.
信息查询