Invention Grant
- Patent Title: Target material control in an EUV light source
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Application No.: US17435861Application Date: 2020-03-09
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Publication No.: US11963285B2Publication Date: 2024-04-16
- Inventor: Abhiram Lakshmi Ganesh Govindaraju , David Bessems , Sandeep Rai , Petrus Adrianus Willems , Serkan Kincal , Joshua Mark Lukens , Jon David Tedrow
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: DiBerardino McGovern IP Group LLC
- International Application: PCT/EP2020/056144 2020.03.09
- International Announcement: WO2020/187617A 2020.09.24
- Date entered country: 2021-09-02
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G03F7/00

Abstract:
Provided is an apparatus that includes a first reservoir system including a first fluid reservoir configured to be in fluid communication with a nozzle supply system during operation of the nozzle supply system, a second reservoir system including a second fluid reservoir configured to be, at least part of the time during operation of the nozzle supply system, in fluid communication with the first reservoir system, a priming system configured to produce a fluid target material from a solid matter, and a fluid control system fluidly connected to the priming system, the first reservoir system, the second reservoir system, and the nozzle supply system. The fluid control system is configured to, during operation of the nozzle supply system: isolate at least one fluid reservoir and the nozzle supply system from the priming system, and maintain a fluid flow path between at least one fluid reservoir and the nozzle supply system.
Public/Granted literature
- US20220159817A1 TARGET MATERIAL CONTROL IN AN EUV LIGHT SOURCE Public/Granted day:2022-05-19
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