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公开(公告)号:US11240904B2
公开(公告)日:2022-02-01
申请号:US16960947
申请日:2019-01-03
Applicant: ASML Netherlands B.V.
Inventor: Joshua Mark Lukens , Bob Rollinger , Pooriya Beyhaghi
IPC: H05G2/00
Abstract: Provided is an apparatus for and method of controlling formation of droplets (102a, b) used to generate EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source (92) includes a fluid exiting an nozzle (98) and a sub-system having an electro-actuatable element (104) producing a disturbance in the fluid (96). The droplet source produces a stream (100) that breaks down into droplets that in turn coalesce into larger droplets as they progress towards the irradiation region. The electro-actuatable element is driven by a hybrid waveform that controls the droplet generation/coalescence process. Also disclosed is a method of determining the transfer function for the nozzle.
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公开(公告)号:US11963285B2
公开(公告)日:2024-04-16
申请号:US17435861
申请日:2020-03-09
Applicant: ASML Netherlands B.V.
Inventor: Abhiram Lakshmi Ganesh Govindaraju , David Bessems , Sandeep Rai , Petrus Adrianus Willems , Serkan Kincal , Joshua Mark Lukens , Jon David Tedrow
CPC classification number: H05G2/006 , G03F7/70033 , H05G2/008
Abstract: Provided is an apparatus that includes a first reservoir system including a first fluid reservoir configured to be in fluid communication with a nozzle supply system during operation of the nozzle supply system, a second reservoir system including a second fluid reservoir configured to be, at least part of the time during operation of the nozzle supply system, in fluid communication with the first reservoir system, a priming system configured to produce a fluid target material from a solid matter, and a fluid control system fluidly connected to the priming system, the first reservoir system, the second reservoir system, and the nozzle supply system. The fluid control system is configured to, during operation of the nozzle supply system: isolate at least one fluid reservoir and the nozzle supply system from the priming system, and maintain a fluid flow path between at least one fluid reservoir and the nozzle supply system.
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公开(公告)号:US11690159B2
公开(公告)日:2023-06-27
申请号:US17284060
申请日:2019-10-25
Applicant: ASML Netherlands B.V.
Inventor: Bob Rollinger , Georgiy Olegovich Vaschenko , Chirag Rajyaguru , Alexander Igorevich Ershov , Joshua Mark Lukens , Mathew Cheeran Abraham
IPC: H05G2/00
CPC classification number: H05G2/006
Abstract: Disclosed is a system for generating EUV radiation in which current flowing through target material in the orifice 320 of a nozzle in a droplet generator is controlled by providing alternate lower impedance paths for the current and/or by limiting a high frequency component of a drive signal applied to the droplet generator.
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4.
公开(公告)号:US20230164900A1
公开(公告)日:2023-05-25
申请号:US18011593
申请日:2021-06-21
Applicant: ASML Netherlands B.V.
Inventor: Alexander Igorevich Ershov , Chirag Rajyaguru , Dietmar Uwe Herbert Trees , Joshua Mark Lukens , Theodorus Wilhelmus Driessen , Robert Jay Rafac , Georgiy Olegovich Vaschenko
IPC: H05G2/00
CPC classification number: H05G2/006 , H05G2/008 , G03F7/70033
Abstract: Apparatus for and method of accelerating droplets used to generate EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting a nozzle in a stream that breaks up into droplets that then undergo coalescence. The droplets are then subjected to a stream of gas that entrains and accelerates the droplets.
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公开(公告)号:US20230028848A1
公开(公告)日:2023-01-26
申请号:US17782695
申请日:2020-11-18
Applicant: ASML Netherlands B.V.
Inventor: Joshua Mark Lukens
Abstract: An apparatus for monitoring a stream of droplets of target material for generating a radiation beam in a radiation source, wherein the apparatus comprises: a target material emitter for creating the stream of droplets of target material, wherein the target material emitter comprises a chamber configured for the target material to pass through before forming the stream of droplets; a first transducer configured to generate acoustic pressures in the chamber, and a second transducer configured to sense the acoustic pressures in the chamber.
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公开(公告)号:US20220159817A1
公开(公告)日:2022-05-19
申请号:US17435861
申请日:2020-03-09
Applicant: ASML Netherlands B.V.
Inventor: Abhiram Lakshmi Ganesh Govindaraju , David Bessems , Sandeep Rai , Petrus Adrianus Willems , Serkan Kincal , Joshua Mark Lukens , Jon David Tedrow
Abstract: Provided is an apparatus that includes a first reservoir system including a first fluid reservoir configured to be in fluid communication with a nozzle supply system during operation of the nozzle supply system, a second reservoir system including a second fluid reservoir configured to be, at least part of the time during operation of the nozzle supply system, in fluid communication with the first reservoir system, a priming system configured to produce a fluid target material from a solid matter, and a fluid control system fluidly connected to the priming system, the first reservoir system, the second reservoir system, and the nozzle supply system. The fluid control system is configured to, during operation of the nozzle supply system: isolate at least one fluid reservoir and the nozzle supply system from the priming system, and maintain a fluid flow path between at least one fluid reservoir and the nozzle supply system.
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7.
公开(公告)号:US20230010985A1
公开(公告)日:2023-01-12
申请号:US17782696
申请日:2020-12-02
Applicant: ASML Netherlands B.V.
Inventor: Pooriya Beyhaghi , Charles Edward Kinney , Bob Rollinger , Joshua Mark Lukens
IPC: H05G2/00
Abstract: A method includes ejecting initial droplets of a material using a nozzle. The method includes applying a pressure on the nozzle using an electromechanical element. The method includes controlling the applied pressure on the nozzle using an electrical signal generated by a waveform generator. The electrical signal includes a first periodic waveform and a second periodic waveform. The method includes coalescing the initial droplets to generate coalesced droplets based on the first and second periodic waveforms and drag. The method includes generating a detection signal, using a detector, corresponding to time intervals between crossings of coalesced droplets at the detector. The method includes determining at least first and second ones of the time intervals using a processor.
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公开(公告)号:US20220295625A1
公开(公告)日:2022-09-15
申请号:US17637654
申请日:2020-09-04
Applicant: ASML Netherlands B.V.
Inventor: Georgiy Olegovich Vaschenko , Bob Rollinger , Joshua Mark Lukens , Alexander Igorevich Ershov , Yoshiho Amada
IPC: H05G2/00
Abstract: An apparatus includes: a tube; a body including: a first body wall and a second body wall; and a support structure including: a first support portion and a second support portion. The first body wall extends in a first direction, the second body wall extends in a second direction that is different than the first direction, a first portion of the tube passes through an opening in the second body wall the first support portion is configured to attach to the first body wall, and a second portion of the tube is configured to pass through the second support portion when the first support portion is attached to the first body wall. An interior of the tube and an interior of the body are configured to receive molten target material, and the target material emits extreme ultraviolet (EUV) light when in a plasma state.
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公开(公告)号:US20210392733A1
公开(公告)日:2021-12-16
申请号:US17284060
申请日:2019-10-25
Applicant: ASML Netherlands B.V.
Inventor: Bob Rollinger , Georgiy Olegovich Vaschenko , Chirag Rajyaguru , Alexander Igorevich Ershov , Joshua Mark Lukens , Mathew Cheeran Abraham
IPC: H05G2/00
Abstract: Disclosed is a system for generating EUV radiation in which current flowing through target material in the orifice 320 of a nozzle in a droplet generator is controlled by providing alternate lower impedance paths for the current and/or by limiting a high frequency component of a drive signal applied to the droplet generator.
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公开(公告)号:US20200344867A1
公开(公告)日:2020-10-29
申请号:US16960947
申请日:2019-01-03
Applicant: ASML Netherlands B.V.
Inventor: Joshua Mark Lukens , Bob Rollinger , Pooriya Beyhaghi
IPC: H05G2/00
Abstract: Provided is an apparatus for and method of controlling formation of droplets (102a, b) used to generate EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source (92) includes a fluid exiting an nozzle (98) and a sub-system having an electro-actuatable element (104) producing a disturbance in the fluid (96). The droplet source produces a stream (100) that breaks down into droplets that in turn coalesce into larger droplets as they progress towards the irradiation region. The electro-actuatable element is driven by a hybrid waveform that controls the droplet generation/coalescence process. Also disclosed is a method of determining the transfer function for the nozzle.
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