- 专利标题: Stress test for grown bad blocks
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申请号: US17886155申请日: 2022-08-11
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公开(公告)号: US11967388B2公开(公告)日: 2024-04-23
- 发明人: Sarath Puthenthermadam , Longju Liu , Parth Amin , Sujjatul Islam , Jiahui Yuan
- 申请人: Western Digital Technologies, Inc.
- 申请人地址: US CA San Jose
- 专利权人: Western Digital Technologies, Inc.
- 当前专利权人: Western Digital Technologies, Inc.
- 当前专利权人地址: US CA San Jose
- 代理机构: Vierra Magen Marcus LLP
- 主分类号: G11C29/00
- IPC分类号: G11C29/00 ; G11C16/04 ; G11C16/10 ; G11C16/16 ; G11C29/12
摘要:
Technology is disclosed herein for detecting grown bad blocks in a non-volatile storage system. A stress test may accelerate stressful conditions on the memory cells and thereby provide for early detection of grown bad blocks. The stress test may include applying a program voltage to a selected word line and a stress voltage that is less than a nominal boosting voltage to a word line adjacent one side of the selected word line. The combination of the program voltage and the stress voltage may generate an e-field that is stronger than an e-field that would be generated in a normal program operation, thereby accelerating the stress on the memory cells. The stress test mat further include programming all of the memory cells to a relatively high threshold voltage, which may create additional stress on the memory cells.
公开/授权文献
- US20240055063A1 STRESS TEST FOR GROWN BAD BLOCKS 公开/授权日:2024-02-15
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