- 专利标题: Moisture governed growth method of atomic layer ribbons and nanoribbons of transition metal dichalcogenides
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申请号: US18051962申请日: 2022-11-02
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公开(公告)号: US11981996B2公开(公告)日: 2024-05-14
- 发明人: Avetik R. Harutyunyan , Xufan Li
- 申请人: HONDA MOTOR CO., LTD.
- 申请人地址: JP Tokyo
- 专利权人: HONDA MOTOR CO., LTD.
- 当前专利权人: HONDA MOTOR CO., LTD.
- 当前专利权人地址: JP Tokyo
- 代理机构: ArentFox Schiff LLP
- 代理商 Mark Duell
- 分案原申请号: US17148129 2021.01.13
- 主分类号: C01G39/06
- IPC分类号: C01G39/06 ; B82Y30/00 ; C01G49/00 ; C01G53/11 ; C23C16/44 ; C23C16/448 ; C23C16/455 ; C23C16/56 ; B82Y40/00
摘要:
A method of making an atomic layer nanoribbon that includes forming a double atomic layer ribbon having a first monolayer and a second monolayer on a surface of the first monolayer, wherein the first monolayer and the second monolayer each contains a transition metal dichalcogenide material, oxidizing at least a portion of the first monolayer to provide an oxidized portion, and removing the oxidized portion to provide an atomic layer nanoribbon of the transition metal dichalcogenide material. Also provided are double atomic layer ribbons, double atomic layer nanoribbons, and single atomic layer nanoribbons prepared according to the method.
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