- 专利标题： Patterned x-ray emitting target
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申请号： US17754998申请日： 2020-10-22
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公开(公告)号： US11996259B2公开(公告)日： 2024-05-28
- 发明人: David A. Reed , Bruce H. Newcome , Bruno W. Schueler
- 申请人： NOVA MEASURING INSTRUMENTS INC.
- 申请人地址： US CA Santa Clara
- 专利权人： NOVA MEASURING INSTRUMENTS INC.
- 当前专利权人： NOVA MEASURING INSTRUMENTS INC.
- 当前专利权人地址： US CA Fremont
- 代理机构： Reches Patents
- 国际申请： PCT/IB2020/059926 2020.10.22
- 国际公布： WO2021/079307A 2021.04.29
- 进入国家日期： 2022-04-18
- 主分类号： H01J35/08
- IPC分类号： H01J35/08 ; G01N23/20008 ; G01N23/207 ; G01N23/2208 ; G01N23/223 ; H01J35/24
摘要：
The present invention is intended to provide improved patterned X-ray emitting targets as well as X-ray sources that include patterned X-ray emitting targets as well as X-ray reflectance scatterometry (XRS) systems and also including X-ray photoelectron spectroscopy (XPS) systems and X-ray fluorescence (XRF) systems which employ such X-ray emitting targets.
公开/授权文献
- US20220390395A1 PATTERNED X-RAY EMITTING TARGET 公开/授权日：2022-12-08
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