公开(公告)号：US12165863B2

公开(公告)日：2024-12-10

申请号：US18469517

申请日：2023-09-18

Applicant: NOVA MEASURING INSTRUMENTS INC.

Inventor： David A. Reed ,  Bruno W. Schueler ,  Bruce H. Newcome ,  Rodney Smedt ,  Chris Bevis

IPC: G01N23/2258 ,  G01N23/22 ,  G01Q10/04 ,  H01J49/12 ,  H01J49/14 ,  H01J49/26 ,  H01L21/66

Abstract: Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry (SIMS) are disclosed. In an example, a secondary ion mass spectrometry (SIMS) system includes a sample stage. A primary ion beam is directed to the sample stage. An extraction lens is directed at the sample stage. The extraction lens is configured to provide a low extraction field for secondary ions emitted from a sample on the sample stage. A magnetic sector spectrograph is coupled to the extraction lens along an optical path of the SIMS system. The magnetic sector spectrograph includes an electrostatic analyzer (ESA) coupled to a magnetic sector analyzer (MSA).

公开(公告)号：US11996259B2

公开(公告)日：2024-05-28

申请号：US17754998

申请日：2020-10-22

Applicant: NOVA MEASURING INSTRUMENTS INC.

Inventor： David A. Reed ,  Bruce H. Newcome ,  Bruno W. Schueler

IPC: H01J35/08 ,  G01N23/20008 ,  G01N23/207 ,  G01N23/2208 ,  G01N23/223 ,  H01J35/24

CPC classification number: H01J35/112 ,  G01N23/20008 ,  G01N23/207 ,  G01N23/2208 ,  G01N23/223 ,  H01J35/24 ,  G01N2223/045 ,  G01N2223/052 ,  G01N2223/056 ,  G01N2223/072 ,  G01N2223/076 ,  G01N2223/085 ,  G01N2223/1016 ,  G01N2223/204 ,  G01N2223/611 ,  H01J2235/081 ,  H01J2235/084 ,  H01J2235/086 ,  H01J2235/1204 ,  H01J2235/1291

Abstract: The present invention is intended to provide improved patterned X-ray emitting targets as well as X-ray sources that include patterned X-ray emitting targets as well as X-ray reflectance scatterometry (XRS) systems and also including X-ray photoelectron spectroscopy (XPS) systems and X-ray fluorescence (XRF) systems which employ such X-ray emitting targets.

公开(公告)号：US10403489B2

公开(公告)日：2019-09-03

申请号：US16039292

申请日：2018-07-18

Applicant: NOVA MEASURING INSTRUMENTS INC.

Inventor： David A. Reed ,  Bruno W. Schueler ,  Bruce H. Newcome ,  Rodney Smedt ,  Chris Bevis

IPC: H01J49/14 ,  H01L21/66 ,  G01N23/22 ,  G01Q10/04 ,  H01J49/26

Abstract: Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry (SIMS) are disclosed. In an example, a secondary ion mass, spectrometry (SIMS) system includes a sample stage. A primary ion beam is directed to the sample stage. An extraction lens is directed at the sample stage. The extraction lens is configured to provide a low extraction field for secondary ions emitted from a sample on the sample stage. A magnetic sector spectrograph is coupled to the extraction lens along an optical path of the SIMS system. The magnetic sector spectrograph includes an electrostatic analyzer (ESA) coupled to a magnetic sector analyzer (MSA).

公开(公告)号：US11764050B2

公开(公告)日：2023-09-19

申请号：US17821785

申请日：2022-08-23

Applicant: NOVA MEASURING INSTRUMENTS INC.

Inventor： David A. Reed ,  Bruno W. Schueler ,  Bruce H. Newcome ,  Rodney Smedt ,  Chris Bevis

IPC: G01N23/2258 ,  G01N23/22 ,  H01J49/14 ,  H01L21/66 ,  H01J49/12 ,  G01Q10/04 ,  H01J49/26

CPC classification number: H01J49/142 ,  G01N23/22 ,  G01N23/2258 ,  G01Q10/04 ,  H01J49/126 ,  H01J49/26 ,  H01L22/12

Abstract: Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry (SIMS) are disclosed. In an example, a secondary ion mass spectrometry (SIMS) system includes a sample stage. A primary ion beam is directed to the sample stage. An extraction lens is directed at the sample stage. The extraction lens is configured to provide a low extraction field for secondary ions emitted from a sample on the sample stage. A magnetic sector spectrograph is coupled to the extraction lens along an optical path of the SIMS system. The magnetic sector spectrograph includes an electrostatic analyzer (ESA) coupled to a magnetic sector analyzer (MSA).

公开(公告)号：US11430647B2

公开(公告)日：2022-08-30

申请号：US17164499

申请日：2021-02-01

Applicant: NOVA MEASURING INSTRUMENTS INC.

Inventor： David A. Reed ,  Bruno W. Schueler ,  Bruce H. Newcome ,  Rodney Smedt ,  Chris Bevis

IPC: H01J49/14 ,  H01L21/66 ,  H01J49/12 ,  G01N23/2258 ,  G01N23/22 ,  G01Q10/04 ,  H01J49/26

Abstract: Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry (SIMS) are disclosed. In an example, a secondary ion mass spectrometry (SIMS) system includes a sample stage. A primary ion beam is directed to the sample stage. An extraction lens is directed at the sample stage. The extraction lens is configured to provide a low extraction field for secondary ions emitted from a sample on the sample stage. A magnetic sector spectrograph is coupled to the extraction lens along an optical path of the SIMS system. The magnetic sector spectrograph includes an electrostatic analyzer (ESA) coupled to a magnetic sector analyzer (MSA).

公开(公告)号：US10910208B2

公开(公告)日：2021-02-02

申请号：US16856940

申请日：2020-04-23

Applicant: NOVA MEASURING INSTRUMENTS INC.

Inventor： David A. Reed ,  Bruno W. Schueler ,  Bruce H. Newcome ,  Rodney Smedt ,  Chris Bevis

IPC: H01J49/14 ,  H01L21/66 ,  H01J49/12 ,  G01N23/22 ,  G01Q10/04 ,  H01J49/26

Abstract: Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry (SIMS) are disclosed. In an example, a secondary ion mass spectrometry (SIMS) system includes a sample stage. A primary ion beam is directed to the sample stage. An extraction lens is directed at the sample stage. The extraction lens is configured to provide a low extraction field for secondary ions emitted from a sample on the sample stage. A magnetic sector spectrograph is coupled to the extraction lens along an optical path of the SIMS system. The magnetic sector spectrograph includes an electrostatic analyzer (ESA) coupled to a magnetic sector analyzer (MSA).

公开(公告)号：US20180330935A1

公开(公告)日：2018-11-15

申请号：US16039292

申请日：2018-07-18

Applicant: NOVA MEASURING INSTRUMENTS INC.

Inventor： David A. REED ,  Bruno W. Schueler ,  Bruce H. Newcome ,  Rodney Smedt ,  Chris Bevis

IPC: H01J49/14 ,  H01J49/26 ,  G01N23/22 ,  G01Q10/04 ,  H01L21/66

CPC classification number: H01J49/142 ,  G01N23/22 ,  G01Q10/04 ,  H01J49/26 ,  H01L22/12

Abstract: Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry (SIMS) are disclosed. In an example, a secondary ion mass, spectrometry (SIMS) system includes a sample stage. A primary ion beam is directed to the sample stage. An extraction lens is directed at the sample stage. The extraction lens is configured to provide a low extraction field for secondary ions emitted from a sample on the sample stage. A magnetic sector spectrograph is coupled to the extraction lens along an optical path of the SIMS system. The magnetic sector spectrograph includes an electrostatic analyzer (ESA) coupled to a magnetic sector analyzer (MSA).

公开(公告)号：US10056242B2

公开(公告)日：2018-08-21

申请号：US15550014

申请日：2016-02-10

Applicant: NOVA MEASURING INSTRUMENTS INC.

Inventor： David A. Reed ,  Bruno W. Schueler ,  Bruce H. Newcome ,  Rodney Smedt ,  Chris Bevis

IPC: H01J49/14 ,  H01L21/66 ,  G01Q10/04 ,  G01N23/22 ,  H01J49/26

CPC classification number: H01J49/142 ,  G01N23/22 ,  G01Q10/04 ,  H01J49/26 ,  H01L22/12

Abstract: Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry (SIMS) are disclosed. In an example, a secondary ion mass spectrometry (SIMS) system includes a sample stage. A primary ion beam is directed to the sample stage. An extraction lens is directed at the sample stage. The extraction lens is configured to provide a low extraction field for secondary ions emitted from a sample on the sample stage. A magnetic sector spectrograph is coupled to the extraction lens along an optical path of the SIMS system. The magnetic sector spectrograph includes an electrostatic analyzer (ESA) coupled to a magnetic sector analyzer (MSA).