Invention Grant
- Patent Title: Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic device, and resin
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Application No.: US16953305Application Date: 2020-11-19
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Publication No.: US12007688B2Publication Date: 2024-06-11
- Inventor: Daisuke Asakawa , Akiyoshi Goto , Masafumi Kojima , Takashi Kawashima , Yasufumi Oishi , Keita Kato
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: JCIPRNET
- Priority: JP 18128916 2018.07.06
- Main IPC: G03F7/039
- IPC: G03F7/039 ; C08F20/18 ; C08F26/06 ; G03F7/038
Abstract:
An actinic ray-sensitive or radiation-sensitive resin composition includes a resin including a repeating unit represented by Formula (1) and capable of increasing a polarity by an action of an acid.
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