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公开(公告)号：US12032290B2
公开(公告)日：2024-07-09
申请号：US17344967
申请日：2021-06-11
Applicant: FUJIFILM Corporation
Inventor： Daisuke Asakawa , Takashi Kawashima , Akiyoshi Goto , Michihiro Shirakawa , Kei Yamamoto
CPC classification number: G03F7/0397 , G03F7/0045 , G03F7/2004 , G03F7/30 , G03F7/322 , G03F7/327 , G03F7/40
Abstract: According to the present invention, an actinic ray-sensitive or radiation-sensitive resin composition including a resin P having a repeating unit represented by General Formula (P1) and a compound that generates an acid having a pKa of −1.40 or more upon irradiation with actinic rays or radiation; and a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the composition, are provided.
Mp represents a single bond or a divalent linking group.
Lp represents a divalent linking group.
Xp represents O, S, or NRN1. RN1 represents a hydrogen atom or a monovalent organic group.
Rp represents a monovalent organic group.-
Patent Agency Ranking
公开(公告)号：US11073762B2
公开(公告)日：2021-07-27
申请号：US16432279
申请日：2019-06-05
Applicant: FUJIFILM Corporation
Inventor： Daisuke Asakawa , Akiyoshi Goto , Masafumi Kojima , Keita Kato , Keiyu Ou , Kyohei Sakita
IPC: G03F7/038 , G03F7/004 , G03F7/039 , G03F7/20 , C09K3/00 , C08F220/26 , C07C309/17 , C07C381/12 , C07C309/12 , C07C309/19
Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition which contains (A) a photoacid generator that generates an acid having a pKa of −1.40 or more upon irradiation with actinic rays or radiation, and (B) a resin having a repeating unit containing an acid-decomposable group, in which an Eth sensitivity of the repeating unit containing an acid-decomposable group is 5.64 or less, and which can provide very excellent roughness performance, exposure latitude, and depth of focus, particularly, in the formation of an ultrafine pattern; a photoacid generator; and an actinic ray-sensitive or radiation-sensitive film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition.
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公开(公告)号：US20210109446A1
公开(公告)日：2021-04-15
申请号：US17130054
申请日：2020-12-22
Applicant: FUJIFILM Corporation
Inventor： Akiyoshi Goto , Takashi Kawashima , Kazunari Yagi , Daisuke Asakawa , Akira Takada
IPC: G03F7/039 , G03F7/038 , C08F220/18 , C08F216/36 , C08F220/28
Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition in which fewer defects are generated in any development treatment of alkali development and organic solvent development, a pattern forming method, a method for manufacturing an electronic device, and a resin. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin having a repeating unit represented by Formula (1) and a repeating unit having an acid-decomposable group, and a photoacid generator.
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公开(公告)号：US12044967B2
公开(公告)日：2024-07-23
申请号：US17001805
申请日：2020-08-25
Applicant: FUJIFILM Corporation
Inventor： Daisuke Asakawa , Hironori Oka , Kyohei Sakita , Michihiro Shirakawa , Akiyoshi Goto
IPC: G03F7/004 , C08F220/18 , C08F220/28 , C08F220/34 , C08F220/38 , G03F7/038 , G03F7/039
CPC classification number: G03F7/0045 , C08F220/1804 , C08F220/1808 , C08F220/283 , G03F7/038 , G03F7/039 , C08F220/346 , C08F220/382 , C08F220/1808 , C08F220/283 , C08F220/387 , C08F212/32 , C08F220/1808 , C08F220/283 , C08F220/20
Abstract: An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition which is capable of forming a pattern having an excellent pattern line width roughness (LWR). In addition, another object of the present invention is to provide:
a resist film, a pattern forming method, and a method for manufacturing an electronic device, each of which uses the actinic ray-sensitive or radiation-sensitive resin composition.
The actinic ray-sensitive or radiation-sensitive resin composition of the present invention includes a resin including a repeating unit derived from a monomer having a salt structure and a repeating unit having a group whose polarity increases through decomposition by the action of an acid,
the salt structure consists of an anionic structure moiety and an actinic ray-sensitive decomposable or radiation-sensitive decomposable cationic structure moiety, and
a pKa of a monomer obtained by substituting the cationic structure moiety in the salt structure with a hydrogen atom is −0.80 or more.-
公开(公告)号：US12007688B2
公开(公告)日：2024-06-11
申请号：US16953305
申请日：2020-11-19
Applicant: FUJIFILM Corporation
Inventor： Daisuke Asakawa , Akiyoshi Goto , Masafumi Kojima , Takashi Kawashima , Yasufumi Oishi , Keita Kato
Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin including a repeating unit represented by Formula (1) and capable of increasing a polarity by an action of an acid.
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公开(公告)号：US20190294043A1
公开(公告)日：2019-09-26
申请号：US16432279
申请日：2019-06-05
Applicant: FUJIFILM Corporation
Inventor： Daisuke Asakawa , Akiyoshi Goto , Masafumi Kojima , Keita Kato , Keiyu Ou , Kyohei Sakita
Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition which contains (A) a photoacid generator that generates an acid having a pKa of −1.40 or more upon irradiation with actinic rays or radiation, and (B) a resin having a repeating unit containing an acid-decomposable group, in which an Eth sensitivity of the repeating unit containing an acid-decomposable group is 5.64 or less, and which can provide very excellent roughness performance, exposure latitude, and depth of focus, particularly, in the formation of an ultrafine pattern; a photoacid generator; and an actinic ray-sensitive or radiation-sensitive film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition.
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