Invention Grant
- Patent Title: Method and system for adjusting location of a wafer and a top plate in a thin-film deposition process
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Application No.: US17494553Application Date: 2021-10-05
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Publication No.: US12014910B2Publication Date: 2024-06-18
- Inventor: Yu-Hsiang Cheng , Che-Wei Wu
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Seed IP Law Group LLP
- Main IPC: C23C16/52
- IPC: C23C16/52 ; H01J37/32

Abstract:
A thin-film deposition system includes a top plate positioned above a wafer and configured to generate a plasma during a thin-film deposition process. The system includes a sensor configured to generate sensor signals indicative of a lifetime of a component of the thin-film deposition system, a characteristic of a thin-film deposited by the thin-film deposition system or a characteristic of a process material that flows into the thin-film deposition system. The system includes a control system configured to adjust a relative location of a top plate of the thin-film deposition system with respect to a location of a wafer in the thin-film deposition system during the thin-film deposition process responsive to the sensor signals.
Information query
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