Invention Grant
- Patent Title: Polishing compositions and methods of using the same
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Application No.: US17509177Application Date: 2021-10-25
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Publication No.: US12024650B2Publication Date: 2024-07-02
- Inventor: Qingmin Cheng , Bin Hu , Yannan Liang , Hyosang Lee , Liqing Wen , Yibin Zhang , Abhudaya Mishra
- Applicant: Fujifilm Electronic Materials U.S.A., Inc.
- Applicant Address: US RI N. Kingstown
- Assignee: Fujifilm Electronic Materials U.S.A., Inc.
- Current Assignee: Fujifilm Electronic Materials U.S.A., Inc.
- Current Assignee Address: US RI N. Kingstown
- Agency: Fish & Richardson P.C.
- Main IPC: C09G1/02
- IPC: C09G1/02 ; C09K13/00 ; H01L21/321
Abstract:
This disclosure relates polishing compositions that include (1) at least one abrasive; (2) at least one organic acid or a salt thereof; (3) at least one first amine compound, the at least one first amine compound including an alkylamine having a 6-24 carbon alkyl chain; (4) at least one second amine compound containing at least two nitrogen atoms, the second amine compound being different from the first amine compound; and (5) an aqueous solvent.
Public/Granted literature
- US20220135840A1 POLISHING COMPOSITIONS AND METHODS OF USING THE SAME Public/Granted day:2022-05-05
Information query
