Invention Grant
- Patent Title: In-plane magnetized spin-orbit magnetic device
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Application No.: US17563100Application Date: 2021-12-28
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Publication No.: US12033682B2Publication Date: 2024-07-09
- Inventor: Hsin-Han Lee , Jeng-Hua Wei , I-Jung Wang , Shan-Yi Yang , Yao-Jen Chang , Fang-Ming Chen
- Applicant: Industrial Technology Research Institute
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: JCIPRNET
- Priority: TW 0144999 2021.12.02
- Main IPC: G11C11/16
- IPC: G11C11/16 ; H10B61/00 ; H10N50/80 ; H10N50/85 ; H10N52/80

Abstract:
An in-plane magnetized spin-orbit magnetic device is provided. The in-plane magnetized spin-orbit magnetic device includes a heavy metal layer, an antiferromagnetic layer, and a magnetic tunnel junction. The antiferromagnetic layer is disposed on the heavy metal layer, and the magnetic tunnel junction is disposed on the antiferromagnetic layer. The magnetic tunnel junction includes a free layer, a barrier layer, and a pinned layer. The barrier layer is disposed on the free layer, and the pinned layer is disposed on the barrier layer. A film surface shape of the free layer is a rounded rectangle.
Public/Granted literature
- US20230178130A1 IN-PLANE MAGNETIZED SPIN-ORBIT MAGNETIC DEVICE Public/Granted day:2023-06-08
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