发明授权
- 专利标题: Polyacetal resin composition, extrusion-molded article, and injection-molded article
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申请号: US17801660申请日: 2021-03-03
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公开(公告)号: US12037486B2公开(公告)日: 2024-07-16
- 发明人: Daisuke Sunaga
- 申请人: MITSUBISHI GAS CHEMICAL COMPANY, INC.
- 申请人地址: JP Tokyo
- 专利权人: MITSUBISHI GAS CHEMICAL COMPANY, INC.
- 当前专利权人: MITSUBISHI GAS CHEMICAL COMPANY, INC.
- 当前专利权人地址: JP Tokyo
- 代理机构: GREENBLUM & BERNSTEIN, P.L.C.
- 优先权: JP 20042784 2020.03.12
- 国际申请: PCT/JP2021/008193 2021.03.03
- 国际公布: WO2021/182242A 2021.09.16
- 进入国家日期: 2022-08-23
- 主分类号: C08L59/00
- IPC分类号: C08L59/00 ; B29C45/00 ; B29C48/00 ; C08K3/26 ; C08K5/10 ; C08K5/20 ; C08L23/06 ; B29K59/00
摘要:
The present invention provides a polyacetal resin composition, which comprises a polyacetal resin, and which further comprises the following (A), (B) and (C), with respect to 100 parts by weight of the polyacetal resin: (A) 0.05 to 5.5 parts by weight of a low-density polyethylene having a melt flow rate of 1.0 to 50 g/10 minutes (190° C., 2.16 kg), (B) 0.05 to 2.0 parts by weight of a fatty acid compound (excluding calcium stearate), and (C) 0.001 to 1.0 part by weight of a layered double hydroxide represented by the following general formula (1): [(M2+)x(M3+)y(OH)2(x+y)](An−)x/n−(H2O) (1) (wherein, in the general formula (1), M2+ represents a divalent metal ion, M3+ represents a trivalent metal ion, An− represents an n-valent anion, wherein one or more of the anions are contained in the layered double hydroxide, x represents a number in the range of 0
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