Invention Grant
- Patent Title: Electronic circuit production method using 3D layer shaping
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Application No.: US17630860Application Date: 2019-07-30
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Publication No.: US12048102B2Publication Date: 2024-07-23
- Inventor: Ryojiro Tominaga , Kenji Tsukada , Ryo Sakakibara , Tasuku Takeuchi
- Applicant: FUJI CORPORATION
- Applicant Address: JP Chiryu
- Assignee: FUJI CORPORATION
- Current Assignee: FUJI CORPORATION
- Current Assignee Address: JP Chiryu
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- International Application: PCT/JP2019/029791 2019.07.30
- International Announcement: WO2021/019675A 2021.02.04
- Date entered country: 2022-01-27
- Main IPC: H05K3/00
- IPC: H05K3/00 ; H05K3/10 ; H05K3/40

Abstract:
To provide an electronic circuit production method using 3D layer shaping capable of producing an electronic circuit having improved electrical properties and mechanical properties by utilizing characteristics of a fluid containing a metal particle by selectively using the fluid containing the metal particle. The electronic circuit production method using 3D layer shaping, the method including a wiring forming step of forming a wiring by applying a fluid containing a nano-sized metal nanoparticle on an insulating member and curing the applied fluid containing the metal nanoparticle; and a connection terminal forming step of forming a connection terminal electrically connected to the wiring by applying a fluid containing a micro-sized metal microparticle and curing the applied fluid containing the metal microparticle.
Public/Granted literature
- US20220279657A1 ELECTRONIC CIRCUIT PRODUCTION METHOD USING 3D LAYER SHAPING Public/Granted day:2022-09-01
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