- 专利标题: Semiconductor device and methods of formation
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申请号: US17811381申请日: 2022-07-08
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公开(公告)号: US12085751B2公开(公告)日: 2024-09-10
- 发明人: Wei-kang Liu , Chih-Tsung Shih , Hau-Yan Lu , YingKit Felix Tsui , Lee-Shian Jeng
- 申请人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Harrity & Harrity, LLP
- 主分类号: G02B6/12
- IPC分类号: G02B6/12 ; G02B6/122 ; G02B6/13 ; G02B6/134 ; G02B6/136
摘要:
Some implementations described herein include a photonics integrated circuit device including a photonics structure. The photonics structure includes a waveguide structure and an optical attenuator structure. In some implementation, the optical attenuator structure is formed on an end region of the waveguide structure and includes a metal material or a doped material. In some implementations, the optical attenuator structure includes a gaussian doping profile within a portion of the waveguide structure. The optical attenuator structure may absorb electromagnetic waves at the end of the waveguide structure with an efficiency that is improved relative to a spiral optical attenuator structure or metal cap optical attenuator structure.
公开/授权文献
- US20240012199A1 SEMICONDUCTOR DEVICE AND METHODS OF FORMATION 公开/授权日:2024-01-11
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