Invention Grant
- Patent Title: Laser system for source material conditioning in an EUV light source
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Application No.: US17633643Application Date: 2020-08-14
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Publication No.: US12085862B2Publication Date: 2024-09-10
- Inventor: Matthew Ryan Graham , Spencer Rich , Sean W. McGrogan
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: DiBerardino McGovern IP Group LLC
- International Application: PCT/EP2020/072939 2020.08.14
- International Announcement: WO2021/028592A 2021.02.18
- Date entered country: 2022-02-08
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/00 ; H05G2/00

Abstract:
Disclosed is an apparatus and a method in which off-droplet measurements instead of on-droplet measurements of prepulse energy are used for pulse energy control. Prepulse energy is measured during an off-droplet nonexposure period and controlled to a prepulse energy setpoint. The prepulse energy can then be controlled open-loop to the prepulse energy setpoint during on-droplet periods. This effectively decouples the EUV dose control loop from the prepulse energy control loop and avoids negative side effects of coupling such loops, for example, loss of the part of the dose adjustment range available to the dose controller.
Public/Granted literature
- US20220317576A1 LASER SYSTEM FOR SOURCE MATERIAL CONDITIONING IN AN EUV LIGHT SOURCE Public/Granted day:2022-10-06
Information query
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