Invention Grant
- Patent Title: Device and method for measuring short-wavelength characteristic X-ray diffraction based on array detection
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Application No.: US17849632Application Date: 2022-06-25
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Publication No.: US12099025B2Publication Date: 2024-09-24
- Inventor: Lin Zheng , Shitao Dou , Xin Chen , Lunwu Zhang , Jin Zhang , Taibin Wu , Luchang Che , Chengzhang Wang , Kun Zhou , Fangchao Zhao , Changguang He , Xianhe Feng
- Applicant: THE 59TH INSTITUTE OF CHINA ORDNANCE INDUSTRY
- Applicant Address: CN Chongqing
- Assignee: THE 59TH INSTITUTE OF CHINA ORDNANCE INDUSTRY
- Current Assignee: THE 59TH INSTITUTE OF CHINA ORDNANCE INDUSTRY
- Current Assignee Address: CN Chongqing
- Agency: Apex Attorneys at Law, LLP
- Agent Yue (Robert) Xu
- Priority: CN 2110709363.2 2021.06.25
- Main IPC: G01N23/207
- IPC: G01N23/207 ; G01N23/20008 ; G01N23/20091 ; G01N23/2055

Abstract:
A device for measuring short-wavelength characteristic X-ray diffraction based on array detection, and a measurement and analysis method based on the device are provided. An array detector of the device only detects and receives a diffraction ray which is diffracted by a material of a to-be-measured part inside a sample and passes through a through hole of a receiving collimator, and rays passing through a positioning hole. The to-be-measured part inside the sample is placed at the center of the diffractometer circle of the device. The method is performed with the device. With the present disclosure, a diffraction pattern of a part inside the sample with a centimeter thickness, i.e. Debye rings, can be rapidly and non-destructively measured, thereby rapidly and non-destructively measuring and analyzing crystal structures, and its crystal structural change of the part inside the sample, such as phase, texture, and stress.
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