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公开(公告)号：US12099025B2
公开(公告)日：2024-09-24
申请号：US17849632
申请日：2022-06-25
Inventor： Lin Zheng , Shitao Dou , Xin Chen , Lunwu Zhang , Jin Zhang , Taibin Wu , Luchang Che , Chengzhang Wang , Kun Zhou , Fangchao Zhao , Changguang He , Xianhe Feng
IPC: G01N23/207 , G01N23/20008 , G01N23/20091 , G01N23/2055
CPC classification number: G01N23/207 , G01N23/20008 , G01N23/20091 , G01N23/2055 , G01N2223/0563 , G01N2223/0566 , G01N2223/1016 , G01N2223/204 , G01N2223/3037 , G01N2223/316 , G01N2223/3306 , G01N2223/3307 , G01N2223/3308 , G01N2223/331 , G01N2223/501 , G01N2223/605 , G01N2223/606 , G01N2223/607
Abstract: A device for measuring short-wavelength characteristic X-ray diffraction based on array detection, and a measurement and analysis method based on the device are provided. An array detector of the device only detects and receives a diffraction ray which is diffracted by a material of a to-be-measured part inside a sample and passes through a through hole of a receiving collimator, and rays passing through a positioning hole. The to-be-measured part inside the sample is placed at the center of the diffractometer circle of the device. The method is performed with the device. With the present disclosure, a diffraction pattern of a part inside the sample with a centimeter thickness, i.e. Debye rings, can be rapidly and non-destructively measured, thereby rapidly and non-destructively measuring and analyzing crystal structures, and its crystal structural change of the part inside the sample, such as phase, texture, and stress.
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公开(公告)号：US20220074877A1
公开(公告)日：2022-03-10
申请号：US17418867
申请日：2019-12-06
Inventor： Lin ZHENG , Shitao DOU , Changguang HE , Zhengkun PENG , Yong XIAO , Lunwu ZHANG , Jin ZHANG , Xianhe FENG
IPC: G01N23/20025
Abstract: A diffraction device and a method for non-destructive testing of internal crystal orientation uniformity of a workpiece. The diffraction device comprises: an X-ray irradiation system used for irradiating X-ray to a measuring part of a measured sample (4); an X-ray detection system used for detecting a plurality of diffraction X-rays formed by diffracting the X-ray with a plurality of parts of the measured sample (4), to measure X-ray diffraction intensity distribution of the measured sample (4). The detected X-ray is short-wavelength feature X-ray, and the X-ray detection system is an array detection system (5). The method comprises steps of selecting the short-wavelength feature X-ray, performing texture analysis on the measured sample (4), and determining a diffraction vector Q to be measured; and obtaining the X-ray diffraction intensity of the corresponding part of the measured sample (4). The method can rapidly and non-destructively test the internal crystal orientation uniformity of a centimeter-thick workpiece in its entire thickness direction, and implement online testing and characterization of the internal crystal orientation uniformity of the centimeter-thick workpiece in the entire thickness direction of its movement trajectory.
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公开(公告)号：US11846595B2
公开(公告)日：2023-12-19
申请号：US17418867
申请日：2019-12-06
Inventor： Lin Zheng , Shitao Dou , Changguang He , Zhengkun Peng , Yong Xiao , Lunwu Zhang , Jin Zhang , Xianhe Feng
IPC: G01N23/207 , G01N23/20 , G01N23/20025 , G01N23/20008
CPC classification number: G01N23/20025 , G01N23/20 , G01N23/207 , G01N23/20008 , G01N2223/056 , G01N2223/302 , G01N2223/602 , G01N2223/605
Abstract: A diffraction apparatus and a method for non-destructively testing internal crystal orientation uniformity of a workpiece are provided. The apparatus includes: an X-ray irradiation system for irradiating an X-ray to a measured part of a sample under testing, and an X-ray detection system for simultaneously detecting a plurality of diffracted X-rays formed by diffraction of a plurality of parts of the sample under testing, to measure an X-ray diffraction intensity distribution of the sample under testing, where the detected diffracted X-rays are short-wavelength characteristic X-rays, and the X-ray detection system is an array detection system. By the apparatus and the method, the detection efficiency is greatly improved.
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公开(公告)号：US20220412901A1
公开(公告)日：2022-12-29
申请号：US17849632
申请日：2022-06-25
Inventor： Lin ZHENG , Shitao DOU , Xin CHEN , Lunwu ZHANG , Jin ZHANG , Taibin WU , Luchang CHE , Chengzhang WANG , Kun ZHOU , Fangchao ZHAO , Changguang HE , Xianhe FENG
IPC: G01N23/207 , G01N23/20008
Abstract: A device for measuring short-wavelength characteristic X-ray diffraction based on array detection, and a measurement and analysis method based on the device are provided. An array detector of the device only detects and receives a diffraction ray which is diffracted by a material of a to-be-measured part inside a sample and passes through a through hole of a receiving collimator, and rays passing through a positioning hole. The to-be-measured part inside the sample is placed at the center of the diffractometer circle of the device. The method is performed with the device. With the present disclosure, a diffraction pattern of a part inside the sample with a centimeter thickness, i.e. Debye rings, can be rapidly and non-destructively measured, thereby rapidly and non-destructively measuring and analyzing crystal structures, and its crystal structural change of the part inside the sample, such as phase, texture, and stress.
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