- 专利标题: Semiconductor storage device
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申请号: US17902725申请日: 2022-09-02
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公开(公告)号: US12112807B2公开(公告)日: 2024-10-08
- 发明人: Mina Hatakeyama
- 申请人: KIOXIA CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: Kioxia Corporation
- 当前专利权人: Kioxia Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Kim & Stewart LLP
- 优先权: JP 22047651 2022.03.23
- 主分类号: G11C16/14
- IPC分类号: G11C16/14 ; G11C16/26
摘要:
A semiconductor storage device includes a circuit, a first plurality of conductive layers arranged along a first direction, extending along a second direction, and including first through third layers, the first layer between the second and third layers, a second plurality of conductive layers including fourth through sixth layers corresponding to the first through third layers and separated therefrom, a semiconductor layer extending between the first and second pluralities, and a charge storage layer between the semiconductor layer and the first and second pluralities. The circuit applies, in a verification operation of a write operation on the first conductive layer, a verification voltage to the first layer, a voltage smaller than the verification voltage to the fourth layer, a read voltage larger than the verification voltage to the second and fifth conductive layers, and a second voltage smaller than the read voltage to the third or sixth conductive layer.
公开/授权文献
- US20230307059A1 SEMICONDUCTOR STORAGE DEVICE 公开/授权日:2023-09-28
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