Invention Grant
- Patent Title: Dual color via patterning
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Application No.: US17483922Application Date: 2021-09-24
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Publication No.: US12113013B2Publication Date: 2024-10-08
- Inventor: Hsueh-Chung Chen , Yann Mignot , Su Chen Fan , Mary Claire Silvestre , Chi-Chun Liu , Junli Wang
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Otterstedt & Kammer PLLC
- Agent L. Jeffrey Kelly
- Main IPC: H01L23/522
- IPC: H01L23/522 ; H01L21/768 ; H01L23/532

Abstract:
A device includes: a first dielectric material; a first metal line in the first dielectric material; a second dielectric material disposed on the first dielectric material and the first metal line; a second metal line in the second dielectric material; and a plurality of metal vias disposed on a same level and connecting the first metal line and the second metal line, wherein the plurality of metal vias comprise a first top via and a bottom via having different sidewall profile angles.
Public/Granted literature
- US20230100368A1 DUAL COLOR VIA PATTERNING Public/Granted day:2023-03-30
Information query
IPC分类: