- 专利标题: Arc lamp with forming gas for thermal processing systems
-
申请号: US18336552申请日: 2023-06-16
-
公开(公告)号: US12119216B2公开(公告)日: 2024-10-15
- 发明人: Michael X. Yang , Rolf Bremensdorfer , Dave Camm , Joseph Cibere , Dieter Hezler , Shawming Ma , Yun Yang
- 申请人: Beijing E-Town Semiconductor Technology Co., Ltd. , Mattson Technology, Inc.
- 申请人地址: CN CA Beijing
- 专利权人: Beijing E-Town Semiconductor Technology Co., Ltd.,Mattson Technology, Inc.
- 当前专利权人: Beijing E-Town Semiconductor Technology Co., Ltd.,Mattson Technology, Inc.
- 当前专利权人地址: CN Beijing; US CA Fremont
- 代理机构: Dority & Manning, P.A.
- 主分类号: H01J61/073
- IPC分类号: H01J61/073 ; H01J61/28 ; H01J61/52 ; H01J61/86 ; H05H1/48
摘要:
Apparatus, systems, and methods for processing workpieces are provided. An arc lamp can include a tube. The arc lamp can include one or more inlets configured to receive water to be circulated through the arc lamp during operation as a water wall, the water wall configured to cool the arc lamp. The arc lamp can include a plurality of electrodes configured to generate a plasma in a forming gas introduced into the arc lamp via the one or more inlets. The forming gas can be or can include a mixture of a hydrogen gas and an inert gas, the hydrogen gas in the mixture having a concentration less than 4% by volume. The hydrogen gas can be introduced into the arc lamp prior to generating the plasma. The arc lamp may be used for processing workpieces.
公开/授权文献
- US20230352294A1 Arc Lamp With Forming Gas For Thermal Processing Systems 公开/授权日:2023-11-02
信息查询