• 专利标题: Manufacturing apparatus of semiconductor device
  • 申请号: US18012944
    申请日: 2021-12-13
  • 公开(公告)号: US12131921B2
    公开(公告)日: 2024-10-29
  • 发明人: Kohei SeyamaTakahiro Shimizu
  • 申请人: SHINKAWA LTD.
  • 申请人地址: JP Tokyo
  • 专利权人: SHINKAWA LTD.
  • 当前专利权人: SHINKAWA LTD.
  • 当前专利权人地址: JP Tokyo
  • 代理机构: JCIPRNET
  • 优先权: WO TJP2021001678 2021.01.19
  • 国际申请: PCT/JP2021/045830 2021.12.13
  • 国际公布: WO2022/158166A 2022.07.28
  • 进入国家日期: 2022-12-26
  • 主分类号: B32B43/00
  • IPC分类号: B32B43/00 B32B41/00 H01L21/67 H01L21/683
Manufacturing apparatus of semiconductor device
摘要:
A manufacturing apparatus (10) for manufacturing a semiconductor device includes: a wafer holding device (12), a PU device (14) having a PU head (40) that holds a target chip (100) in a non-contact manner, an energy irradiation device (16) irradiating energy to the target chip (100) from a back surface side of a dicing tape (130) to reduce an adhesive force of the dicing tape (130), and a controller (22). An adhesive layer of the dicing tape (130) is a self-peeling adhesive layer having an adhesive force that decreases with irradiation of the energy and floats the target chip (100) by a small distance. The controller (22) controls a position of the PU head (40) so that the target chip (100) and the PU head (40) do not come into contact with each other even if the target chip (100) floats during a takeoff preparation period.
公开/授权文献
信息查询
0/0