- 专利标题: Power supply module and charged particle beam device
-
申请号: US17763840申请日: 2019-10-07
-
公开(公告)号: US12132411B2公开(公告)日: 2024-10-29
- 发明人: Ryo Kadoi , Wen Li , Naoya Ishigaki
- 申请人: Hitachi High-Tech Corporation
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Tech Corporation
- 当前专利权人: Hitachi High-Tech Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Crowell & Moring LLP
- 国际申请: PCT/JP2019/039497 2019.10.07
- 国际公布: WO2021/070223A 2021.04.15
- 进入国家日期: 2022-03-25
- 主分类号: H02M7/10
- IPC分类号: H02M7/10 ; H01J19/02 ; H01J37/24 ; H02M1/14 ; H02M7/06 ; H05H5/04
摘要:
The invention provides a power supply module and a charged particle beam device that are capable of reducing ripple noise. A high-voltage generation circuit 101 includes booster circuits CPa and CPb of two systems that are configured to be symmetrical to each other, and performs a boosting operation by using a capacitive element and a diode in the booster circuits CPa and CPb of the two systems. The high-voltage generation circuit is housed in a housing and a reference power supply voltage is applied thereto. A left electrode 102a is fixedly provided in the vicinity of one of the booster circuits CPa and CPb of the two systems in the housing, and a right electrode 102b is fixedly provided in the vicinity of the other of the booster circuits CPa and CPb of the two systems in the housing. A stray capacitance adjustment circuit 100a adjusts capacitance values of stray capacitances of the booster circuits CPa and CPb of the two systems by electrically controlling an electrical connection characteristic between the left electrode 102a and the reference power supply voltage 104 and an electrical connection characteristic between the right electrode 102b and the reference power supply voltage 104.
公开/授权文献
- US20220319795A1 Power Supply Module and Charged Particle Beam Device 公开/授权日:2022-10-06
信息查询
IPC分类: