Invention Grant
- Patent Title: Polymerizable monomers and method of polymerizing the same
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Application No.: US17027590Application Date: 2020-09-21
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Publication No.: US12152092B2Publication Date: 2024-11-26
- Inventor: Robert Liska , Christian Gorsche , Markus Kury , Yan Chen , Chunhua Li , Srinivas Kaza
- Applicant: Align Technology, Inc.
- Applicant Address: US CA San Jose
- Assignee: Align Technology, Inc.
- Current Assignee: Align Technology, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Seed IP Law Group LLP
- Main IPC: C08F120/30
- IPC: C08F120/30 ; B33Y70/00 ; G03F7/00 ; A61C7/08 ; B33Y10/00 ; B33Y80/00 ; C08F2/48
Abstract:
Provided herein are photopolymerizable monomers, optionally for use as reactive diluents in a high temperature lithography-based photopolymerization process, a method of producing polymers using said photopolymerizable monomers, the polymers thus produced, and orthodontic appliances comprising the polymers.
Public/Granted literature
- US20210002396A1 POLYMERIZABLE MONOMERS AND METHOD OF POLYMERIZING THE SAME Public/Granted day:2021-01-07
Information query
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