公开(公告)号：US12152092B2

公开(公告)日：2024-11-26

申请号：US17027590

申请日：2020-09-21

Applicant: Align Technology, Inc.

Inventor： Robert Liska ,  Christian Gorsche ,  Markus Kury ,  Yan Chen ,  Chunhua Li ,  Srinivas Kaza

IPC: C08F120/30 ,  B33Y70/00 ,  G03F7/00 ,  A61C7/08 ,  B33Y10/00 ,  B33Y80/00 ,  C08F2/48

Abstract: Provided herein are photopolymerizable monomers, optionally for use as reactive diluents in a high temperature lithography-based photopolymerization process, a method of producing polymers using said photopolymerizable monomers, the polymers thus produced, and orthodontic appliances comprising the polymers.

公开(公告)号：US10465116B2

公开(公告)日：2019-11-05

申请号：US13996211

申请日：2011-12-21

Applicant: Hubert Seiberle

Inventor： Hubert Seiberle

IPC: G02F1/1337 ,  C09K19/38 ,  C08F120/30 ,  C08F220/30 ,  B32B27/36 ,  G02F1/13363 ,  G02F1/1335

Abstract: The present invention relates to novel photoactive polymer materials their use as orienting layer for liquid crystals, which are used for the production of non-structured and structured optical elements or electro-optical elements and multi-layer systems.

公开(公告)号：US20180273694A1

公开(公告)日：2018-09-27

申请号：US15994537

申请日：2018-05-31

Applicant: FUJI ELECTRIC CO., LTD. ,  MIE UNIVERSITY

Inventor： Tomoki Hasegawa ,  Masamitsu Funaoka

IPC: C08H7/00 ,  C08G59/06 ,  C08K3/08 ,  C08G18/32 ,  C08G18/24 ,  C08G18/76 ,  C08F120/30 ,  C22B7/00 ,  B29C39/00 ,  B29C39/38

CPC classification number: C08H6/00 ,  B29C39/003 ,  B29C39/38 ,  B29K2063/00 ,  B29K2075/00 ,  C08F120/30 ,  C08G18/242 ,  C08G18/3215 ,  C08G18/7671 ,  C08G59/063 ,  C08K3/08 ,  C08L97/005 ,  C22B7/003 ,  Y02P10/212

Abstract: A resin composition including a lignin skeleton capable of producing a heat-resistant molded article and being decomposed under relatively mild conditions. The resin composition contains a lignin skeleton including, as a base component, a phenolated lignin or a derivative thereof that contains a reactive monomer group, the phenolated lignin containing a phenol-containing monomer represented by the following general formula (I): wherein R1 to R5 are each independently a monovalent group selected from H, OH, a C1 to C6 alkyl group, a C1 to C6 alkoxy group, and a C6 to C10 aryl group, or adjacent substituents among R1 to R5 form a substituted or unsubstituted aromatic ring together, at least one of R1 and R2 is a hydroxyl group, and R6 is OCH3 or H; a molded article thereof, as well as a recycling method for a molded article formed in a mold formed of the resin composition.

公开(公告)号：US20120009795A1

公开(公告)日：2012-01-12

申请号：US13237657

申请日：2011-09-20

Applicant: Masayuki ENDOU ,  Masaru Sasago

Inventor： Masayuki ENDOU ,  Masaru Sasago

IPC: H01L21/311 ,  C08F120/30 ,  C08F116/14 ,  G03F7/20

CPC classification number: C08F8/00 ,  C08F220/28 ,  G03F7/0392

Abstract: A resist film (102) made of a chemically amplified resist material including a polymer containing an acid leaving group and a group in which a lactone is replaced with hydrogen in an OH group of phenol is formed on a substrate (101). The resist film (102) is then selectively irradiated with exposure light, thereby performing pattern exposure. After the pattern exposure, the resist film (102) is heated, and then developed, thereby forming a resist pattern (102a) out of the resist film (102).

Abstract translation: 在基板（101）上形成抗蚀剂膜（102），其由化学放大抗蚀剂材料制成，该抗蚀剂材料包含含有酸离去基团的聚合物和其中内酯被苯酚OH基团中的氢取代的基团。 然后用曝光光选择性地照射抗蚀剂膜（102），从而进行图案曝光。 在图案曝光之后，将抗蚀剂膜（102）加热，然后显影，从而在抗蚀剂膜（102）中形成抗蚀剂图案（102a）。

公开(公告)号：US5632929A

公开(公告)日：1997-05-27

申请号：US347373

申请日：1994-12-06

Applicant: Mark A. Verrall ,  Owain L. Parri ,  David Coates

Inventor： Mark A. Verrall ,  Owain L. Parri ,  David Coates

IPC: G02F1/13 ,  C08F20/26 ,  C08F120/30 ,  C08F120/36 ,  C08F220/28 ,  C08F220/30 ,  C09K19/38 ,  C09K19/52 ,  C09K19/12

CPC classification number: C08F120/30 ,  C08F120/36 ,  C09K19/3895

Abstract: A novel LCP material based on forked side chain acrylates is disclosed having a general formula I; ##STR1## wherein W=H, CH.sub.3, Cl R.sub.1 and R.sub.2 may or may not be the same but have the following general structure: ##STR2## p=2 to 14; q=0 or 1;r=1 or 2;s=1 or 2;X=O, CO.sub.2, O.sub.2 C, CH.sub.2 ;Y=C.sub.2 H.sub.4, O, CO.sub.2, O.sub.2 C;Z=CN, halogen, R, CO.sub.2 R, OR, O.sub.2 CR, wherein R=chiral or achiral.

Abstract translation: PCT No.PCT / GB93 / 01017 Sec。 371日期1994年12月6日第 102（e）日期1994年12月6日PCT提交1993年5月19日PCT公布。 公开号WO93 / 25633 日本1993年12月23日公开了一种基于叉状侧链丙烯酸酯的新型LCP材料，其具有通式I; 其中W = H，CH 3，Cl R 1和R 2可以相同也可以不相同，但具有以下通用结构：p = 2〜14; q = 0或1; r = 1或2; s = 1或2; X = O，CO 2，O 2 C，CH 2; Y = C2H4，O，CO2，O2C; Z = CN，卤素，R，CO 2 R，OR，O 2 CR，其中R =手性或非手性。

公开(公告)号：US4131729A

公开(公告)日：1978-12-26

申请号：US898680

申请日：1978-04-21

Applicant: Werner Schmitt ,  Robert Purrmann ,  Peter Jochum ,  Wolf-Dietrich Zahler

Inventor： Werner Schmitt ,  Robert Purrmann ,  Peter Jochum ,  Wolf-Dietrich Zahler

IPC: A61K6/083 ,  C08F120/30 ,  C08F32/08 ,  C08F4/34 ,  C08F122/10 ,  C08F132/08

CPC classification number: A61K6/083 ,  C08F120/30 ,  Y10S522/908 ,  Y10S528/92

Abstract: An improved dental composition having shortened hardening time and after hardening increased compressive strength and abrasion resistance, including a radical-inducing compound and a polymerizable acrylic or methacrylic acid ester or diester compound with at least 20 percent by weight of the polymerizable compound being the diacrylic or dimethacrylic acid ester of bishydroxymethyltricyclo [5.2.1.0.sup.2,6 ]-decane. Other monofunctional or difunctional acrylic or methacrylic acid esters as well as fillers, pigments and stabilizers can be included.

Abstract translation: 具有缩短的硬化时间和硬化后的改进的牙科组合物增加抗压强度和耐磨性，包括自由基诱导化合物和可聚合的丙烯酸或甲基丙烯酸酯或二酯化合物，其中至少20重量％的可聚合化合物是二丙烯酸或 双羟甲基三环[5.2.1.02,6] - 癸烷二甲基丙烯酸酯。 可以包括其它单官能或双官能的丙烯酸或甲基丙烯酸酯以及填料，颜料和稳定剂。

公开(公告)号：US4115346A

公开(公告)日：1978-09-19

申请号：US698560

申请日：1976-06-22

Applicant: Albert Gross ,  Roland Schaefer

Inventor： Albert Gross ,  Roland Schaefer

IPC: A61K6/083 ,  C08F120/30 ,  C08G59/16 ,  C08G59/24 ,  C08K3/00 ,  C08K3/36

CPC classification number: C08F120/30 ,  A61K6/083 ,  C08G59/1472 ,  C08G59/24 ,  Y10S528/92

Abstract: Polymerizable hydrox-group-containing diesters of acrylic acids for dental material are prepared by reacting 3-(3,4-epoxycyclohexyl)-8,9-epoxy-2,4-dioxaspiro(5,5) undecane or a bis-epoxide of formula (A) ##STR1## or a bis-epoxide of formula (B) ##STR2## with a hydroxyalkylacrylate or hydroxyalkylmethacrylate containing 2 to 10 carbon atoms in the alkyl portion, n being 0 or 1 in formula (A) with the proviso that whenn in 0, X is --O-- and R.sup.1 is --H; and whenn is 1, X is selected from the group of alkylene with 1 to 10 carbon atoms, C.sub.1-3 -alkyl substituted alkylene with 1 to 10 carbon atoms, --O--(CH.sub.2).sub.m --O-- where m is 1 to 10, --CH.sub.2 --OCO--(CH.sub.2).sub.p --COO--CH.sub.2 where p is 1 to 6, and --CH.sub.2 --OCO--, and R.sup.1 is --H or --CH.sub.3,and in formula (B) ##STR3## OR TRICYCLO-[5,2,1,0.sup.2,6 ]-DECYLENE.

Abstract translation: 通过使3-（3,4-环氧环己基）-8,9-环氧-2,4-二氧杂螺[（5,5）十一烷）或双环氧化物的双 - 环氧化物反应制备用于牙科材料的丙烯酸的可聚合羟基的二酯 式（A）的化合物（A）或式（B）的双环氧化物（B）与烷基部分中含有2至10个碳原子的丙烯酸羟烷基酯或甲基丙烯酸羟烷基酯，式（1）中的n为0或1 A），条件是当N IN 0时，X为-O-且R 1为-H; 并且当N IS 1时，X选自具有1-10个碳原子的亚烷基，具有1-10个碳原子的C1-3烷基取代的亚烷基，-O-（CH2）mO-，其中m是1-10， -CH 2 -OCO-（CH 2）p -COO-CH 2，其中p为1至6，-CH 2 -OCO-，并且R 1为-H或-CH 3，并且在式（B）中， ，2,1,02,6] -DECYLENE。

公开(公告)号：US20240117084A1

公开(公告)日：2024-04-11

申请号：US18464588

申请日：2023-09-11

Applicant: DONGJIN SEMICHEM CO., LTD.

Inventor： Young Jin KWON ,  Seong Chan SON ,  Jin Wuk KIM ,  Dong Min KIM ,  Ja Hun BYEON

IPC: C08F122/10 ,  C08F120/30 ,  C08F122/20 ,  C09D133/14 ,  C09D135/02 ,  H10K59/80

CPC classification number: C08F122/1006 ,  C08F120/30 ,  C08F122/20 ,  C09D133/14 ,  C09D135/02 ,  H10K59/873

Abstract: A curable composition is provided. The curable composition can eliminate or minimize the generation of bubbles inside the cured product after the initiation reaction of the curable monomer, prevent expansion of a material when used to encapsulate a device, and provide a uniform cured product to solve the problem of separation between the upper and lower substrates bonded together, thereby improving device encapsulation performance.

公开(公告)号：US10781275B2

公开(公告)日：2020-09-22

申请号：US16653028

申请日：2019-10-15

Applicant: Align Technology, Inc.

Inventor： Robert Liska ,  Christian Gorsche ,  Markus Kury ,  Yan Chen ,  Chunhua Li ,  Srinivas Kaza

IPC: A61C7/00 ,  A61C7/08 ,  A61C7/10 ,  A61K6/093 ,  C08F120/10 ,  C08F120/30 ,  C08F132/04 ,  G03F7/00 ,  C08F2/48 ,  B33Y80/00 ,  B33Y10/00 ,  B33Y70/00

Abstract: Provided herein are photopolymerizable monomers, optionally for use as reactive diluents in a high temperature lithography-based photopolymerization process, a method of producing polymers using said photopolymerizable monomers, the polymers thus produced, and orthodontic appliances comprising the polymers.

公开(公告)号：US20190169346A1

公开(公告)日：2019-06-06

申请号：US16322612

申请日：2017-07-26

Applicant: BASF SE

Inventor： Andrea MISSKE ,  Anja THOMAS ,  Christoph FLECKENSTEIN ,  Friederike FLEISCHHAKER ,  Szilard CSIHONY ,  Matthias GERST ,  Stephan MOEBIUS ,  Ulrike LICHT ,  Andreas SCHWARZ ,  Eric NEUHAUS

IPC: C08F290/04 ,  C08F120/30 ,  C08F220/14 ,  C08F220/30

Abstract: The present invention describes novel macromonomers containing polyisobutene groups and homo- or copolymers thereof.