Invention Grant
- Patent Title: Electronic substrates having embedded inductors
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Application No.: US17029866Application Date: 2020-09-23
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Publication No.: US12159844B2Publication Date: 2024-12-03
- Inventor: Benjamin Duong , Roy Dittler , Darko Grujicic , Chandrasekharan Nair , Rengarajan Shanmugam
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Essential Patents Group, LLP
- Main IPC: H01L29/00
- IPC: H01L29/00 ; H01F27/24 ; H01F27/28 ; H01F27/32 ; H01L23/64

Abstract:
An electronic substrate may be fabricated by forming a base substrate and forming an inductor extending through the base substrate, wherein the inductor includes a magnetic material layer and a barrier layer, such that the barrier layer prevents the magnetic material layer from leaching into plating solutions during the fabrication of the electronic substrate. In one embodiment, the barrier material may comprise titanium. In another embodiment, the barrier layer may comprise a polymeric material. In still another embodiment, the barrier layer may comprise a nitride material layer. The inductor may further include a plating seed layer on the barrier layer and a conductive fill material abutting the plating seed layer.
Public/Granted literature
- US20220093535A1 ELECTRONIC SUBSTRATES HAVING EMBEDDED INDUCTORS Public/Granted day:2022-03-24
Information query
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