Invention Grant
- Patent Title: Dual-frequency, direct-drive inductively coupled plasma source
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Application No.: US17606686Application Date: 2020-04-24
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Publication No.: US12165841B2Publication Date: 2024-12-10
- Inventor: Maolin Long , Yuhou Wang , Alexander Miller Paterson
- Applicant: Lam Research Corporation
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Penilla IP, APC
- International Application: PCT/US2020/029877 WO 20200424
- International Announcement: WO2020/223127 WO 20201105
- Main IPC: H01J37/32
- IPC: H01J37/32

Abstract:
A direct drive system for providing RF power to a substrate processing system includes a direct drive enclosure including a first direct drive circuit located in the direct drive enclosure and operating at a first frequency and a first connector connected to the first direct drive circuit. A junction box is arranged adjacent to the direct drive enclosure and includes a first capacitive circuit connected to the first direct drive circuit; a second connector located on one side of the junction box, connected to one terminal of the first capacitive circuit and mating with the first connector of the direct drive enclosure; third and fourth connectors connected to another terminal of the first capacitive circuit; and a coil enclosure arranged adjacent to the junction box and including first and second coils and fifth and sixth connectors mating with the third and fourth connectors of the junction box.
Public/Granted literature
- US20220199365A1 DUAL-FREQUENCY, DIRECT-DRIVE INDUCTIVELY COUPLED PLASMA SOURCE Public/Granted day:2022-06-23
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