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公开(公告)号：US20230282448A1
公开(公告)日：2023-09-07
申请号：US18015708
申请日：2021-07-01
CPC分类号： H01J37/32146 , H01J37/32183 , H03H7/38 , H01J2237/334
摘要： Systems and methods for pulsing radio frequency (RF) coils are described. One of the methods includes supplying a first RF signal to a first impedance matching circuit coupled to a first RF coil, supplying a second RF signal to a second impedance matching circuit coupled to a second RF coil, and pulsing the first RF signal between a first parameter level and a second parameter level. The method includes pulsing the second RF signal between a third parameter level and a fourth parameter level in reverse synchronization with the pulsing of the first RF signal.
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公开(公告)号：US11495441B2
公开(公告)日：2022-11-08
申请号：US17084103
申请日：2020-10-29
发明人： Jon McChesney , Saravanapriyan Sriraman , Richard A. Marsh , Alexander Miller Paterson , John Holland
IPC分类号： H01J37/32
摘要： In one embodiment, a plasma processing device may include a dielectric window, a vacuum chamber, an energy source, and at least one air amplifier. The dielectric window may include a plasma exposed surface and an air exposed surface. The vacuum chamber and the plasma exposed surface of the dielectric window can cooperate to enclose a plasma processing gas. The energy source can transmit electromagnetic energy through the dielectric window and form an elevated temperature region in the dielectric window. The at least one air amplifier can be in fluid communication with the dielectric window. The at least one air amplifier can operate at a back pressure of at least about 1 in-H2O and can provide at least about 30 cfm of air.
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公开(公告)号：US20220199365A1
公开(公告)日：2022-06-23
申请号：US17606686
申请日：2020-04-24
IPC分类号： H01J37/32
摘要： A direct drive system for providing RF power to a substrate processing system includes a direct drive enclosure including a first direct drive circuit located in the direct drive enclosure and operating at a first frequency and a first connector connected to the first direct drive circuit. A junction box is arranged adjacent to the direct drive enclosure and includes a first capacitive circuit connected to the first direct drive circuit; a second connector located on one side of the junction box, connected to one terminal of the first capacitive circuit and mating with the first connector of the direct drive enclosure; third and fourth connectors connected to another terminal of the first capacitive circuit; and a coil enclosure arranged adjacent to the junction box and including first and second coils and fifth and sixth connectors mating with the third and fourth connectors of the junction box.
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公开(公告)号：US11728137B2
公开(公告)日：2023-08-15
申请号：US17267920
申请日：2019-08-08
发明人： Yuhou Wang , Maolin Long , Ying Wu , Alexander Miller Paterson
IPC分类号： H01J37/32
CPC分类号： H01J37/32165 , H01J37/32183 , H01J2237/24564 , H01J2237/24585
摘要： A drive circuit for providing RF power to a component of a substrate processing system includes a plasma source operating at a first frequency. A load includes the component of the substrate processing system. An impedance network connects the plasma source to the load. A current sensor senses current at an output of the plasma source. A voltage sensor senses voltage at the output of the plasma source. A controller includes a tuned frequency calculator configured to calculate a tuned frequency for the plasma source based on the voltage, the current, and a configuration of the impedance network and to adjust the first frequency based on the tuned frequency.
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5.发明公开公开(公告)号：US20230154728A1
公开(公告)日：2023-05-18
申请号：US17916643
申请日：2021-04-01
IPC分类号： H01J37/32 , H01L21/311 , H01L21/3213
CPC分类号： H01J37/32146 , H01J37/32568 , H01J37/32119 , H01J37/32165 , H01L21/31122 , H01L21/32136 , H01J2237/334
摘要： Multiple, sequential pulses of radiofrequency power are supplied to an electrode of a plasma processing chamber to control a plasma within the plasma processing chamber. Each of the pulses of radiofrequency power includes a first duration over which a first radiofrequency power profile exists, immediately followed by a second duration over which a second radiofrequency power profile exists. The first radiofrequency power profile has greater radiofrequency power than the second radiofrequency power profile. The first duration is less than the second duration. And, the sequential pulses of radiofrequency power are separated from each other by a third duration. A radiofrequency signal generation system is provided to generate and control the multiple, sequential pulses of radiofrequency power.
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公开(公告)号：US20180138069A1
公开(公告)日：2018-05-17
申请号：US15799011
申请日：2017-10-31
发明人： Ali Sucipto Tan , Haoquan Yan , Marc Estoque , Damon Tyrone Genetti , Jon McChesney , Alexander Miller Paterson
IPC分类号： H01L21/68 , H01L21/687
摘要： A system for determining an alignment of an edge ring on a substrate support includes a robot control module configured to control a robot to place the edge ring onto the substrate support and retrieve the edge ring from the substrate support. An alignment module is configured to determine a plurality of first positions of the edge ring on the robot prior to being placed onto the substrate support and determine a plurality of second positions of the edge ring on the robot subsequent to being retrieved from the substrate support. An edge ring position module configured to determine a centered position of the edge ring relative to the substrate support based on offsets between the plurality of first positions and the plurality of second positions.
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公开(公告)号：US20240331976A1
公开(公告)日：2024-10-03
申请号：US18740449
申请日：2024-06-11
发明人： Ying Wu , John Stephen Drewery , Alexander Miller Paterson , Xiang Zhou , Zhuoxian Wang , Yoshie Kimura
IPC分类号： H01J37/32
CPC分类号： H01J37/32146 , H01J37/32174 , H01J37/32091 , H01J37/321 , H01J2237/334
摘要： Systems and methods for synchronization of radio frequency (RF) generators are described. One of the methods includes receiving, by a first RF generator, a first recipe set, which includes information regarding a first plurality of pulse blocks for operating the first RF generator. The method further includes receiving, by a second RF generator, a second recipe set, which includes information regarding a second plurality of pulse blocks for operating a second RF generator. Upon receiving a digital pulsed signal, the method includes executing the first recipe set and executing the second recipe set. The method further includes outputting a first one of the pulse blocks of the first plurality based on the first recipe set in synchronization with a synchronization signal. The method includes outputting a first one of the pulse blocks of the second plurality based on the second recipe set in synchronization with the synchronization signal.
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公开(公告)号：US20210358757A1
公开(公告)日：2021-11-18
申请号：US17298931
申请日：2019-11-22
发明人： Juline Shoeb , Alexander Miller Paterson , Ying Wu
IPC分类号： H01L21/3065 , H01J37/32 , H01J37/305
摘要： Systems and methods for etching different features in a substantially equal manner are described. One of the methods includes applying a low frequency bias signal during a low TCP state and applying a high frequency bias signal during a high TCP state. The application of the low frequency bias signal during the low TCP state facilitates generation of hot neutrals, which are used to increase an etch rate of etching dense features compared to an etch rate for etching isolation features. The application of the high frequency bias signal during the high TCP state facilitates generation of ions to increase an etch rate of etching the isolation features compared to an etch rate of etching the dense features. After applying the low frequency bias signal during the low TCP state and the high frequency bias signal during the high TCP state, the isolation and dense features are etched similarly.
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9.发明申请公开(公告)号：US20180294566A1
公开(公告)日：2018-10-11
申请号：US15942629
申请日：2018-04-02
发明人： Yuhou Wang , Arthur H. Sato , Ying Wu , Alexander Miller Paterson
IPC分类号： H01Q5/335
摘要： A radio frequency (RF) matching circuit control system includes an RF matching circuit including a plurality of tunable components. The RF matching circuit is configured to receive an input signal including at least two pulsing levels from an RF generator, provide an output signal to a load based on the input signal, and match an impedance associated with the input signal to impedances of the load. A controller is configured to determine respective impedances of the load for the at least two pulsing levels of the input signal and adjust operating parameters of the plurality of tunable components to align a frequency tuning range of the RF matching circuit with the respective impedances of the load for the at least two pulsing levels to match the impedance associated with the input signal to the respective impedances.
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公开(公告)号：US12119232B2
公开(公告)日：2024-10-15
申请号：US17847971
申请日：2022-06-23
发明人： Juline Shoeb , Alexander Miller Paterson , Ying Wu
IPC分类号： H01L21/306 , H01J37/305 , H01J37/32 , H01L21/3065
CPC分类号： H01L21/3065 , H01J37/3053 , H01J37/321
摘要： Systems and methods for etching different features in a substantially equal manner are described. One of the methods includes applying a low frequency bias signal during a low TCP state and applying a high frequency bias signal during a high TCP state. The application of the low frequency bias signal during the low TCP state facilitates generation of hot neutrals, which are used to increase an etch rate of etching dense features compared to an etch rate for etching isolation features. The application of the high frequency bias signal during the high TCP state facilitates generation of ions to increase an etch rate of etching the isolation features compared to an etch rate of etching the dense features. After applying the low frequency bias signal during the low TCP state and the high frequency bias signal during the high TCP state, the isolation and dense features are etched similarly.
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