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公开(公告)号：US20240030000A1
公开(公告)日：2024-01-25
申请号：US18480495
申请日：2023-10-03
发明人： Maolin Long , Zhongkui Tan , Ying Wu , Qian Fu , Alex Paterson , John Drewery
IPC分类号： H01J37/32
CPC分类号： H01J37/321 , H01J37/32146 , H01J37/32128 , H01L21/3065
摘要： Systems and methods for reverse pulsing are described. One of the methods includes receiving a digital signal having a first state and a second state. The method further includes generating a transformer coupled plasma (TCP) radio frequency (RF) pulsed signal having a high state when the digital signal is in the first state and having a low state when the digital signal is in the second state. The method includes providing the TCP RF pulsed signal to one or more coils of a plasma chamber, generating a bias RF pulsed signal having a low state when the digital signal is in the first state and having a high state when the digital signal is in the second state, and providing the bias RF pulsed signal to a chuck of the plasma chamber.
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公开(公告)号：US11728136B2
公开(公告)日：2023-08-15
申请号：US17729451
申请日：2022-04-26
发明人： Maolin Long , Yuhou Wang , Ying Wu , Alex Paterson
CPC分类号： H01J37/32128 , H01J37/3211 , H03K4/92 , H01J2237/334
摘要： A system and method for generating a radio frequency (RF) waveform are described. The method includes defining a train of on-off pulses separated by an off state having no on-off pulses. The method further includes applying a multi-level pulse waveform that adjusts a magnitude of each of the on-off pulses to generate an RF waveform. The method includes sending the RF waveform to an electrode.
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公开(公告)号：US20220199365A1
公开(公告)日：2022-06-23
申请号：US17606686
申请日：2020-04-24
IPC分类号： H01J37/32
摘要： A direct drive system for providing RF power to a substrate processing system includes a direct drive enclosure including a first direct drive circuit located in the direct drive enclosure and operating at a first frequency and a first connector connected to the first direct drive circuit. A junction box is arranged adjacent to the direct drive enclosure and includes a first capacitive circuit connected to the first direct drive circuit; a second connector located on one side of the junction box, connected to one terminal of the first capacitive circuit and mating with the first connector of the direct drive enclosure; third and fourth connectors connected to another terminal of the first capacitive circuit; and a coil enclosure arranged adjacent to the junction box and including first and second coils and fifth and sixth connectors mating with the third and fourth connectors of the junction box.
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公开(公告)号：US10672590B2
公开(公告)日：2020-06-02
申请号：US15921266
申请日：2018-03-14
发明人： Maolin Long , Yuhou Wang , Ying Wu , Alex Paterson
IPC分类号： H01J37/32
摘要： Frequency tuning for a matchless plasma source is described. To perform the frequency tuning, current is measured at an output of an amplification circuit of the matchless plasma source after a change in a frequency of operation of the matchless plasma source. Upon determining that the current has increased with the change in the frequency of operation, the frequency of operation is further changed until the current has decreased. When the current has decreased, the changed frequency of operation is further modified to be an operational frequency. When the matchless plasma source operates at the operational frequency, the current at the output of the amplification circuit is maximized.
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公开(公告)号：US20190287764A1
公开(公告)日：2019-09-19
申请号：US15921266
申请日：2018-03-14
发明人： Maolin Long , Yuhou Wang , Ying Wu , Alex Paterson
IPC分类号： H01J37/32
摘要： Frequency tuning for a matchless plasma source is described. To perform the frequency tuning, current is measured at an output of an amplification circuit of the matchless plasma source after a change in a frequency of operation of the matchless plasma source. Upon determining that the current has increased with the change in the frequency of operation, the frequency of operation is further changed until the current has decreased. When the current has decreased, the changed frequency of operation is further modified to be an operational frequency. When the matchless plasma source operates at the operational frequency, the current at the output of the amplification circuit is maximized.
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公开(公告)号：US20190116656A1
公开(公告)日：2019-04-18
申请号：US15787660
申请日：2017-10-18
发明人： Maolin Long , Yuhou Wang , Ricky Marsh , Alex Paterson
IPC分类号： H05H1/46
摘要： A matchless plasma source is described. The matchless plasma source includes a controller that is coupled to a direct current (DC) voltage source of an agile DC rail to control a shape of an amplified square waveform that is generated at an output of a half-bridge transistor circuit. The matchless plasma source further includes the half-bridge transistor circuit used to generate the amplified square waveform to power an electrode, such as an antenna, of a plasma chamber. The matchless plasma source also includes a reactive circuit between the half-bridge transistor circuit and the electrode. The reactive circuit has a high-quality factor to negate a reactance of the electrode. There is no radio frequency (RF) match and an RF cable that couples the matchless plasma source to the electrode.
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7.发明申请公开(公告)号：US20180358205A1
公开(公告)日：2018-12-13
申请号：US15617366
申请日：2017-06-08
发明人： Maolin Long , Alex Paterson
摘要： A substrate processing system includes a processing chamber including a substrate support to support a substrate. A coil is arranged around the processing chamber. A first RF source provides first RF power at a first magnitude and a first frequency. A first pulsing circuit applies a duty cycle to the first RF source. A tuning circuit receives an output of the first pulsing circuit, includes a first variable capacitor, and has an output in communication with the coil to generate plasma in the processing chamber. A controller includes a data acquisition module to generate feedback. A feedback control module controls at least one of the first frequency and the first variable capacitor based on the feedback and a gain value. The controller selects the gain value based on at least one of the first frequency and the duty cycle.
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公开(公告)号：US20170040174A1
公开(公告)日：2017-02-09
申请号：US14863331
申请日：2015-09-23
发明人： Maolin Long , Zhongkui Tan , Ying Wu , Qian Fu , Alex Paterson , John Drewery
IPC分类号： H01L21/3065 , H01L21/67
CPC分类号： H01L21/3065 , H01J37/321 , H01J37/32146 , H01J37/32422 , H01L21/67069
摘要： Systems and methods for reverse pulsing are described. One of the methods includes receiving a digital signal having a first state and a second state. The method further includes generating a transformer coupled plasma (TCP) radio frequency (RF) pulsed signal having a high state when the digital signal is in the first state and having a low state when the digital signal is in the second state. The method includes providing the TCP RF pulsed signal to one or more coils of a plasma chamber, generating a bias RF pulsed signal having a low state when the digital signal is in the first state and having a high state when the digital signal is in the second state, and providing the bias RF pulsed signal to a chuck of the plasma chamber.
摘要翻译： 描述了用于反向脉冲的系统和方法。 方法之一包括接收具有第一状态和第二状态的数字信号。 该方法还包括当数字信号处于第一状态时产生具有高状态的变压器耦合等离子体（TCP）射频（RF）脉冲信号，并且当数字信号处于第二状态时具有低状态。 该方法包括将TCP RF脉冲信号提供给等离子体室的一个或多个线圈，当数字信号处于第一状态时产生具有低状态的偏置RF脉冲信号，并且当数字信号处于 并且将偏压RF脉冲信号提供给等离子体室的卡盘。
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公开(公告)号：US11798785B2
公开(公告)日：2023-10-24
申请号：US15701176
申请日：2017-09-11
发明人： Maolin Long , Zhongkui Tan , Ying Wu , Qian Fu , Alex Paterson , John Drewery
IPC分类号： H01J37/32 , H01L21/67 , H01L21/3065
CPC分类号： H01J37/321 , H01J37/32128 , H01J37/32146 , H01J37/32183 , H01J37/32577 , H01L21/3065 , H01L21/67069
摘要： Systems and methods for reverse pulsing are described. One of the systems includes a controller, first and second source radio frequency (RF) generators, and first and second bias RF generators. The controller controls the first source RF generator to generate a first source pulsed signal, and controls the second source RF generator to generate a second source pulsed signal. The system includes a first match circuit that receives the first and second source pulsed signals and combines the first and second source pulsed signals. The controller controls the first bias RF generator to generate a first bias pulsed signal, and controls the second bias RF generator to generate a second bias pulsed signal. The system includes a second match circuit that receives the first and second bias pulsed signals and combines the first and second bias pulsed signals into a combined bias signal.
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公开(公告)号：US11728137B2
公开(公告)日：2023-08-15
申请号：US17267920
申请日：2019-08-08
发明人： Yuhou Wang , Maolin Long , Ying Wu , Alexander Miller Paterson
IPC分类号： H01J37/32
CPC分类号： H01J37/32165 , H01J37/32183 , H01J2237/24564 , H01J2237/24585
摘要： A drive circuit for providing RF power to a component of a substrate processing system includes a plasma source operating at a first frequency. A load includes the component of the substrate processing system. An impedance network connects the plasma source to the load. A current sensor senses current at an output of the plasma source. A voltage sensor senses voltage at the output of the plasma source. A controller includes a tuned frequency calculator configured to calculate a tuned frequency for the plasma source based on the voltage, the current, and a configuration of the impedance network and to adjust the first frequency based on the tuned frequency.
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