Invention Grant
- Patent Title: Semiconductor storage device
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Application No.: US17891386Application Date: 2022-08-19
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Publication No.: US12178049B2Publication Date: 2024-12-24
- Inventor: Hiroyuki Kutsukake
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Main IPC: H10B41/23
- IPC: H10B41/23 ; G11C16/08 ; G11C16/26 ; H10B41/35 ; H10B43/23 ; H10B43/35

Abstract:
A semiconductor storage device includes a semiconductor substrate including a first region, a second region, and a third region, located apart from each other in such an order in a first direction in an element region. Each of the first to third regions including a source and/or drain region. The semiconductor storage device further includes a first conductor layer provided above the element region and having a first opening; a second conductor layer provided above the element region, having a second opening, and located apart from the first conductor layer in the first direction; a first contact, in the first opening, that is connected to the first region; a second contact, in the second opening, that is connected to the third region; a first memory cell connected to the first contact; and a second memory cell connected to the second contact.
Public/Granted literature
- US20230292519A1 SEMICONDUCTOR STORAGE DEVICE Public/Granted day:2023-09-14
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