Invention Grant
- Patent Title: Hybrid pulsed laser deposition of complex oxide thin films made from elements having a large vapor pressure mismatch
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Application No.: US18151550Application Date: 2023-01-09
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Publication No.: US12180610B2Publication Date: 2024-12-31
- Inventor: Chang-Beom Eom , Jungwoo Lee , Jieun Kim
- Applicant: Wisconsin Alumni Research Foundation
- Applicant Address: US WI Madison
- Assignee: Wisconsin Alumni Research Foundation
- Current Assignee: Wisconsin Alumni Research Foundation
- Current Assignee Address: US WI Madison
- Agency: Bell & Manning, LLC
- Main IPC: C30B23/02
- IPC: C30B23/02 ; C30B29/24 ; C30B29/30 ; C30B29/32 ; C30B29/68

Abstract:
Apparatus and methods for growing films of complex layered metal oxides with high stoichiometries and high crystal qualities are provided. The layered complex metal oxides include two or more metals and oxygen and have a layered structure. The methods, which are referred to as hybrid pulsed laser deposition (hybrid PLD), synergistically combine the advantages of molecular beam epitaxy (MBE) and pulsed laser deposition (PLD) to grow complex metal oxide films that include metals with very different vapor pressures.
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