公开(公告)号：US12180610B2

公开(公告)日：2024-12-31

申请号：US18151550

申请日：2023-01-09

Applicant: Wisconsin Alumni Research Foundation

Inventor： Chang-Beom Eom ,  Jungwoo Lee ,  Jieun Kim

IPC: C30B23/02 ,  C30B29/24 ,  C30B29/30 ,  C30B29/32 ,  C30B29/68

Abstract: Apparatus and methods for growing films of complex layered metal oxides with high stoichiometries and high crystal qualities are provided. The layered complex metal oxides include two or more metals and oxygen and have a layered structure. The methods, which are referred to as hybrid pulsed laser deposition (hybrid PLD), synergistically combine the advantages of molecular beam epitaxy (MBE) and pulsed laser deposition (PLD) to grow complex metal oxide films that include metals with very different vapor pressures.

公开(公告)号：US20240229292A1

公开(公告)日：2024-07-11

申请号：US18151550

申请日：2023-01-09

Applicant: Wisconsin Alumni Research Foundation

Inventor： Chang-Beom Eom ,  Jungwoo Lee ,  Jieun Kim

IPC: C30B23/02 ,  C30B29/24 ,  C30B29/30 ,  C30B29/32 ,  C30B29/68

CPC classification number: C30B23/02 ,  C30B29/24 ,  C30B29/30 ,  C30B29/32 ,  C30B29/68

Abstract: Apparatus and methods for growing films of complex layered metal oxides with high stoichiometries and high crystal qualities are provided. The layered complex metal oxides include two or more metals and oxygen and have a layered structure. The methods, which are referred to as hybrid pulsed laser deposition (hybrid PLD), synergistically combine the advantages of molecular beam epitaxy (MBE) and pulsed laser deposition (PLD) to grow complex metal oxide films that include metals with very different vapor pressures.