- Patent Title: Structure for producing diamond and method for manufacturing same
-
Application No.: US17507417Application Date: 2021-10-21
-
Publication No.: US12227828B2Publication Date: 2025-02-18
- Inventor: Hideo Aida , Atsuhito Sawabe , Yutaka Kimura , Jun Mizuno , Ryuji Oshima
- Applicant: National University Corporation Nagaoka University of Technology , Atsuhito Sawabe , Yutaka Kimura , WASEDA UNIVERSITY , DISCO Corporation
- Applicant Address: JP Nagaoka; JP Sagamihara; JP Sagamihara; JP Tokyo; JP Tokyo
- Assignee: National University Corporation Nagaoka University of Technology,Atsuhito Sawabe,Yutaka Kimura,WASEDA UNIVERSITY,DISCO Corporation
- Current Assignee: National University Corporation Nagaoka University of Technology,Atsuhito Sawabe,Yutaka Kimura,WASEDA UNIVERSITY,DISCO Corporation
- Current Assignee Address: JP Nagaoka; JP Sagamihara; JP Sagamihara; JP Tokyo; JP Tokyo
- Agency: The Webb Law Firm
- Priority: JP2020-177489 20201022
- Main IPC: C23C16/02
- IPC: C23C16/02 ; C23C14/14 ; C23C16/27 ; C30B23/02 ; C30B25/18 ; C30B29/02 ; C30B33/00

Abstract:
Provided are a structure for producing a high-quality single crystal diamond, and a method for manufacturing the structure for producing diamond. A structure for producing a diamond is composed of a base substrate and an Ir thin film formed on the base substrate. The thermal expansion coefficient of the base substrate is 5 times or less of the thermal expansion coefficient of diamond and the melting point of the base substrate is 700° C. or higher. The peak angle in the X-ray diffraction pattern of the Ir thin film is different from the peak angle in the X-ray diffraction pattern of the base substrate.
Public/Granted literature
- US20220127719A1 Structure for Producing Diamond and Method for Manufacturing Same Public/Granted day:2022-04-28
Information query
IPC分类: