Invention Grant
- Patent Title: Substrate support, lithographic apparatus, method for manipulating charge distribution and method for preparing a substrate
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Application No.: US17775361Application Date: 2020-10-16
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Publication No.: US12242204B2Publication Date: 2025-03-04
- Inventor: Ruud Antonius Catharina Maria Beerens , Koen Gerhardus Winkels , Dirk Willem Harberts , Lucas Henricus Johannes Stevens , Dennis Dominic Van Der Voort , Edwin Johannes Cornelis Bos , George Alois Leonie Leenknegt , Nicolaas Ten Kate
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: EP19209256 20191114
- International Application: PCT/EP2020/079297 WO 20201016
- International Announcement: WO2021/094057 WO 20210520
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/00 ; H01L21/67 ; H01L21/687
Abstract:
A substrate support configured to support a substrate. The substrate support has a plurality of burls protruding from a base surface of the substrate support. The burls have distal ends for supporting a lower surface of the substrate with a gap between the base surface of the substrate support and the lower surface of the substrate. The substrate support has a liquid supply channel configured to supply a conductive liquid to the gap so as to bridge the gap between the base surface of the substrate support and the lower surface of the substrate, to allow charge to pass between the substrate support and the substrate. The substrate support has a controlled electrical potential such that charge distribution at the lower surface of the substrate can be manipulated.
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