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公开(公告)号：US12007693B2
公开(公告)日：2024-06-11
申请号：US17600763
申请日：2020-04-03
Inventor： Ruud Antonius Catharina Maria Beerens , Nico Johannes Antonius Hubertus Boonen , Stefan Michael Bruno Bäumer , Tolga Mehmet Ergin , Andreas Kristian Hopf , Derk Jan Wilfred Klunder , Martin Anton Lambert , Stefan Piehler , Manisha Ranjan , Frank Bernhard Sperling , Andrey Sergeevich Tychkov , Jasper Witte , Jiayue Yuan
CPC classification number: G03F7/70033 , H01S3/0071 , H05G2/008
Abstract: A laser focusing system (330) for use in an EUV radiation source is described, the laser focusing system comprising: •—a first curved mirror (330.1) configured to receive a laser beam from a beam delivery system (320) and generate a first reflected laser beam (316); •—a second curved mirror (330.2) configured to receive the first reflected laser beam (316) and generate a second reflected laser beam (317), wherein the laser focusing system (330) is configured to focus the second reflected laser beam (317) to a target location (340) in a vessel (350) of the EUV radiation source (360).
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公开(公告)号：US09494869B2
公开(公告)日：2016-11-15
申请号：US14357530
申请日：2012-12-05
Applicant: ASML Netherlands B.V.
Inventor： Hans Butler , Arno Jan Bleeker , Pieter Renaat Maria Hennus , Martinus Hendricus Henricus Hoeks , Sven Antoin Johan Hol , Harmen Klaas Van Der Schoot , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Marc Wilhelmus Maria Van Der Wijst , Koen Jacobus Johannes Maria Zaal , Theodorus Petrus Maria Cadee , Ruud Antonius Catharina Maria Beerens , Olof Martinus Josephus Fischer , Wilhelmus Henricus Theodorus Maria Aangenent , Niels Johannes Maria Bosch
CPC classification number: G03F7/70258 , G03F7/70275 , G03F7/70366 , G03F7/70391 , G03F7/704 , G03F7/70558 , G03F7/70816 , G03F7/709
Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.
Abstract translation: 一种曝光装置，包括：投影系统，被配置为将多个辐射束投影到目标上; 至少可绕轴旋转的可移动框架; 以及致动器系统，其构造成将可移动框架移动到远离与可移动框架的几何中心对应的轴线的轴线上，并使框架围绕通过框架的质心的轴线旋转。
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3.发明申请公开(公告)号：US20150168852A1
公开(公告)日：2015-06-18
申请号：US14407038
申请日：2013-06-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Ruud Antonius Catharina Maria Beerens , Andre Bernardus Jeunink , Marinus Maria Johannes Van De Wal , Wilhelmus Henricus Theodorus Maria Aangenent , Richard Henricus Adrianus Van Lieshout , Henricus Martinus Johannes Van De Groes , Saartje Willemijn Van Der Hoeven
IPC: G03F7/20
CPC classification number: G03F7/70775 , G03F7/70783
Abstract: There is provided a positioning system for positioning an object in a lithographic apparatus. The positioning system includes a support, a position measurement device, a deformation sensor and a processor. The support is constructed to hold the object. The position measurement device is configured to measure a position of the support. The position measurement device includes at least one position sensor target and a plurality of position sensors to cooperate with the at least one position sensor target to provide a redundant set of position signals representing the position of the support. The deformation sensor is arranged to provide a deformation signal representing a deformation of one of the support and the position measurement device. The processor is configured to calibrate one of the position measurement device and the deformation sensor based on the deformation signal and the redundant set of position signals.
Abstract translation: 提供了一种用于在光刻设备中定位物体的定位系统。 定位系统包括支撑件，位置测量装置，变形传感器和处理器。 构造支撑件来保持对象。 位置测量装置被配置为测量支撑件的位置。 所述位置测量装置包括至少一个位置传感器目标和多个位置传感器，以与所述至少一个位置传感器目标配合，以提供代表所述支撑件的位置的冗余的一组位置信号。 变形传感器被布置成提供表示支撑件和位置测量装置之一的变形的变形信号。 处理器被配置为基于变形信号和冗余的位置信号集来校准位置测量装置和变形传感器之一。
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公开(公告)号：US09983482B2
公开(公告)日：2018-05-29
申请号：US14775263
申请日：2014-02-26
Applicant: ASML Netherlands B.V. , Carl Zeiss SMT GmbH
Inventor： Erik Roelof Loopstra , Olav Waldemar Vladimir Frijns , Stig Bieling , Antonius Theodorus Wilhelmus Kempen , Ivo Vanderhallen , Nicolaas Ten Kate , Ruud Antonius Catharina Maria Beerens , Richard Henricus Adrianus Van Lieshout , Theodorus Petrus Maria Cadee , Sjoerd Nicolaas Lambertus Donders , Alexander Matthijs Struycken , Marcus Petrus Scheepers
CPC classification number: G03F7/70033 , G02B5/0891 , G02B19/0095 , G03F7/70166 , G03F7/702 , G03F7/70916 , G03F7/70983 , G21K1/067 , H05G2/003 , H05G2/008
Abstract: A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.
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5.发明授权公开(公告)号：US10061213B2
公开(公告)日：2018-08-28
申请号：US15505885
申请日：2015-07-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Antonius Gerardus Akkermans , Ruud Antonius Catharina Maria Beerens , Sander Christiaan Broers , Jeroen Johannes Theodorus Hendrikus De Best , Adrianus Marinus Wouter Heeren , George Alois Leonie Leenknegt , Bo Lenssen , Hendrikus Johannes Schellens , Peter Van Der Krieken , Theodorus Petrus Maria Cadee , Jan Van Eijk , Richard Henricus Adrianus Van Lieshout
CPC classification number: G03F7/70775 , G01L1/16 , G01P15/0915 , G01P15/18 , G03F7/70716 , G03F7/70783 , G03F7/7085 , H01L41/1132
Abstract: A sensor includes two shear-mode piezoelectric transducers, wherein each piezoelectric transducer has a bottom surface and a top surface, wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces of the piezoelectric transducers are configured to be attached to an object to be measured.
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Patent Agency Ranking
6.发明授权Lithographic apparatus, device manufacturing method and displacement measurement system 有权光刻设备，器件制造方法和位移测量系统公开(公告)号：US09575416B2
公开(公告)日：2017-02-21
申请号：US14419910
申请日：2013-08-02
Applicant: ASML Netherlands B.V.
Inventor： Engelbertus Antonius Fransiscus Van Der Pasch , Ruud Antonius Catharina Maria Beerens , Martinus Agnes Willem Cuijpers , Christiaan Alexander Hoogendam , Fransiscus Mathijs Jacobs , Willem Herman Gertruda Anna Koenen , Erik Roelof Loopstra
IPC: G03F7/20
CPC classification number: G03F7/70483 , G03F7/70725 , G03F7/70775
Abstract: A lithographic apparatus including a moveable object (WT) and a displacement measuring system arranged to determine a position quantity of the moveable object. The displacement measuring system includes an encoder (BC) and a grid structure. One of the encoder and the grid structure is connected to the moveable object. The grid structure includes a high precision grid portion (HG) and a low precision grid portion (LG). The encoder is arranged to cooperate with the high precision grid portion to determine the position quantity relative to the grid structure with a high precision. The encoder is arranged to cooperate with the low precision grid portion to determine the position quantity relative to the grid structure with a low precision.
Abstract translation: 一种光刻设备，包括可移动物体（WT）和位移测量系统，其布置成确定可移动物体的位置量。 位移测量系统包括编码器（BC）和网格结构。 编码器和网格结构之一连接到可移动对象。 栅格结构包括高精度栅格部分（HG）和低精度栅格部分（LG）。 编码器配置成与高精度格栅部分配合，以高精度确定相对于格栅结构的位置量。 编码器配置成与低精度格栅部分配合，以较低精度确定相对于格栅结构的位置数量。
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公开(公告)号：US09410796B2
公开(公告)日：2016-08-09
申请号：US13687524
申请日：2012-11-28
Applicant: ASML Netherlands B.V.
Inventor： Ruud Antonius Catharina Maria Beerens , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen , Theodorus Petrus Maria Cadee , Raymond Wilhelmus Louis Lafarre
CPC classification number: G01B11/14 , G03F7/70008 , G03F7/70775
Abstract: A displacement measurement system comprising at least one retro reflector and a diffraction grating. Said displacement measurement system is constructed and arranged to measure a displacement by providing a first beam of radiation to the measurement system, wherein the diffraction grating is arranged to diffract the first beam of radiation a first time to form diffracted beams. The at least one retro reflector is arranged to subsequently redirect the diffracted beams to diffract a second time on the diffraction grating. The at least one retro reflector is arranged to redirect the diffraction beams to diffract at least a third time on the diffraction grating before the diffracted beams are being recombined to form a second beam. And the displacement system is provided with a sensor configured to receive the second beam and determine the displacement from an intensity of the second beam.
Abstract translation: 一种位移测量系统，包括至少一个回射反射器和衍射光栅。 所述位移测量系统被构造和布置成通过向测量系统提供第一辐射束来测量位移，其中衍射光栅被布置成第一次衍射第一辐射束以形成衍射光束。 所述至少一个回射反射器被布置成随后重定向衍射光束以在衍射光栅上第二次衍射。 所述至少一个回射反射器被布置成在衍射光束被重新组合以形成第二光束之前将衍射光束重定向至少在衍射光栅上衍射至少三次。 并且位移系统设置有被配置为接收第二光束并且从第二光束的强度确定位移的传感器。
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公开(公告)号：US09360774B2
公开(公告)日：2016-06-07
申请号：US13720369
申请日：2012-12-19
Applicant: ASML Netherlands B.V.
Inventor： Johannes Hendrikus Maria Spruit , Ruud Antonius Catharina Maria Beerens , Richard Henricus Adrianus Van Lieshout , Cristian Dan
CPC classification number: G03F7/70783 , G03B27/522 , G03F7/7085
Abstract: Disclosed is a lithographic apparatus comprising a member susceptible to deformation and a deformation sensor for measuring a deformation of said member. The deformation sensor comprises a first birefringence sensing element arranged to be subjected to stress in dependency of the deformation of said member and a light system configured to transmit polarized light through the first birefringence sensing element, wherein said polarized light has a first polarization state prior to being transmitted through the first birefringence sensing element. The deformation sensor further comprises a detector for detecting a second polarization state of the polarized light after being transmitted through the first birefringence sensing element and a calculation unit to determine the deformation of said member based on the first and second polarization state.
Abstract translation: 公开了一种包括易于变形的构件的光刻设备和用于测量所述构件的变形的变形传感器。 变形传感器包括第一双折射感测元件，其被布置为根据所述构件的变形而受到应力，以及被配置为透射偏振光通过第一双折射感测元件的光系统，其中所述偏振光具有第一偏振态 通过第一双折射检测元件透射。 变形传感器还包括检测器，用于检测通过第一双折射检测元件透射后的偏振光的第二偏振态，以及计算单元，用于基于第一和第二偏振状态确定所述构件的变形。
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公开(公告)号：US20150227060A1
公开(公告)日：2015-08-13
申请号：US14423405
申请日：2013-08-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Ruud Antonius Catharina Maria Beerens , Rob Johan Theodoor Rutten , Jan Steven Christiaan Westerlaken , Koen Jacobus Johannes Maria Zaal , Richard Henricus Adrianus Van Lieshout , Engelbertus Antonius Fransiscus Van Der Pasch
CPC classification number: G03F7/70725 , G01D5/34 , G01D5/38 , G03F7/70775 , G03F7/70933
Abstract: A stage system includes a movable stage, and an encoder for measuring a position of the stage, wherein the encoder includes an emitter for emitting an encoder beam, a grating for interacting with the encoder beam, and a detector for detecting the encoder beam having interacted with the grating, the encoder beam in use propagating along an optical path; a purging cap at least partly enclosing the optical path; and a purging medium supply device for supplying a purging medium into the purging cap.
Abstract translation: 舞台系统包括可移动舞台和用于测量舞台位置的编码器，其中编码器包括用于发射编码器光束的发射器，用于与编码器光束相互作用的光栅，以及用于检测具有相互影响的编码器光束的检测器 利用光栅，编码器光束在使用中沿光路传播; 至少部分地包围光路的清洗盖; 以及用于将清洗介质供给到清洗盖中的清洗介质供给装置。
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10.发明授权公开(公告)号：US10012914B2
公开(公告)日：2018-07-03
申请号：US15505885
申请日：2015-07-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Antonius Gerardus Akkermans , Ruud Antonius Catharina Maria Beerens , Sander Christiaan Broers , Jeroen Johannes Theodorus Hendrikus De Best , Adrianus Marinus Wouter Heeren , George Alois Leonie Leenknegt , Bo Lenssen , Hendrikus Johannes Schellens , Peter Van Der Krieken , Theodorus Petrus Maria Cadee , Jan Van Eijk , Richard Henricus Adrianus Van Lieshout
Abstract: A sensor includes two shear-mode piezoelectric transducers, wherein each piezoelectric transducer has a bottom surface and a top surface, wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces of the piezoelectric transducers are configured to be attached to an object to be measured.
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