Invention Grant
- Patent Title: Processing method and processing apparatus
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Application No.: US17657962Application Date: 2022-04-05
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Publication No.: US12261078B2Publication Date: 2025-03-25
- Inventor: Takuya Umise , Masato Shinada , Tetsuya Miyashita
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Armstrong Teasdale LLP
- Priority: JP2021-067478 20210413
- Main IPC: H01L21/68
- IPC: H01L21/68 ; H01L21/687

Abstract:
A processing method for processing a substrate includes: a first arrangement step of mounting, on a stage provided in a processing container to mount the substrate on the stage, a plate-shaped protective member which is prepared in advance at a location in the processing container different from a location on the stage and which is configured to protect an upper surface of the stage; an adjustment step of adjusting a distance between the stage and an annular cover member provided above an edge portion of the stage to a second distance different from a first distance between the stage and the cover member when the substrate is processed; and a pretreatment step of performing a pretreatment in the processing container to change a state in the processing container to a predetermined state, wherein the protective member has a thickness different from a thickness of the substrate.
Public/Granted literature
- US20220328343A1 PROCESSING METHOD AND PROCESSING APPARATUS Public/Granted day:2022-10-13
Information query
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