Invention Grant
- Patent Title: High electron mobility transistor
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Application No.: US17475700Application Date: 2021-09-15
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Publication No.: US12278281B2Publication Date: 2025-04-15
- Inventor: Sunkyu Hwang , Jaejoon Oh , Jongseob Kim
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: HARNESS, DICKEY & PIERCE, P.L.C.
- Priority: KR10-2021-0064214 20210518
- Main IPC: H01L29/778
- IPC: H01L29/778 ; H01L29/20 ; H01L29/205 ; H01L29/47

Abstract:
A high electron mobility transistor (HEMT) includes an active region, in which a channel is formed, and a field region surrounding the active region. The HEMT may include a channel layer; a barrier layer on the channel layer and configured to induce a two-dimensional electron gas (2DEG) in the channel layer; a source and a drain on the barrier layer in the active region; and a gate on the barrier layer. The gate may protrude from the active region to the field region on the barrier layer. The gate may include a first gate and a second gate. The first gate may be in the active region and the second gate may be in the boundary region between the active region and the field region. A work function of the second gate may be different from a work function of the first gate.
Public/Granted literature
- US20220376102A1 HIGH ELECTRON MOBILITY TRANSISTOR Public/Granted day:2022-11-24
Information query
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