Invention Grant
- Patent Title: Stage system, lithographic apparatus, method for positioning and device manufacturing method
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Application No.: US18398860Application Date: 2023-12-28
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Publication No.: US12287586B2Publication Date: 2025-04-29
- Inventor: Stef Marten Johan Janssens , Bert Dirk Scholten , Sjoerd Nicolaas Lambertus Donders , Teunis Van Dam , Peter Mark Overschie , Theresa Mary Spaan-Burke , Siegfried Alexander Tromp
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: EP16177447 20160701,EP17158730 20170301
- Main IPC: G03F7/00
- IPC: G03F7/00 ; H01L21/683 ; H01L21/67
Abstract:
A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system that includes a plurality of gas bearing devices. Each gas bearing device includes: a gas bearing body, which has a free surface, a primary channel which extends through the gas bearing body and has an inlet opening in the free surface, a secondary channel system which extends through the gas bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system is higher than the flow resistance in the primary channel.
Public/Granted literature
- US20240168394A1 STAGE SYSTEM, LITHOGRAPHIC APPARATUS, METHOD FOR POSITIONING AND DEVICE MANUFACTURING METHOD Public/Granted day:2024-05-23
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