公开(公告)号：US11860552B2

公开(公告)日：2024-01-02

申请号：US16309501

申请日：2017-06-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Stef Marten Johan Janssens ,  Bert Dirk Scholten ,  Sjoerd Nicolaas Lambertus Donders ,  Teunis Van Dam ,  Peter Mark Overschie ,  Theresa Mary Spaan-Burke ,  Siegfried Alexander Tromp

IPC: G03F7/00 ,  H01L21/683 ,  H01L21/67

CPC classification number: G03F7/70725 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/70816 ,  H01L21/6838 ,  H01L21/67288

Abstract: A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. The stage system has a plurality of air bearing devices. Each air bearing device has: a gas bearing body which has a free surface, a primary channel which extends through the bearing body and has an inlet opening in the free surface, and a secondary channel system which extends through the bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system can be higher than the flow resistance in the primary channel.