Invention Grant
- Patent Title: Electrochemical formation of substrate coatings
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Application No.: US18457214Application Date: 2023-08-28
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Publication No.: US12294076B2Publication Date: 2025-05-06
- Inventor: Betar Gallant , Haining Gao
- Applicant: Massachusetts Institute of Technology
- Applicant Address: US MA Cambridge
- Assignee: Massachusetts Institute of Technology
- Current Assignee: Massachusetts Institute of Technology
- Current Assignee Address: US MA Cambridge
- Agency: Wolf, Greenfield & Sacks, P.C.
- Main IPC: H01M4/1397
- IPC: H01M4/1397 ; H01M4/02 ; H01M4/04 ; H01M4/136 ; H01M4/38 ; H01M4/50 ; H01M8/0245
Abstract:
Systems, articles, and methods generally related to the electrochemical formation of layers comprising halogen ions on substrates are described.
Public/Granted literature
- US20230402581A1 ELECTROCHEMICAL FORMATION OF SUBSTRATE COATINGS Public/Granted day:2023-12-14
Information query
