公开(公告)号：US20230402581A1

公开(公告)日：2023-12-14

申请号：US18457214

申请日：2023-08-28

Applicant: Massachusetts Institute of Technology

Inventor： Betar Gallant ,  Haining Gao

IPC: H01M4/1397 ,  H01M4/04 ,  H01M4/136 ,  H01M4/50 ,  H01M8/0245 ,  H01M4/38

CPC classification number: H01M4/1397 ,  H01M4/0402 ,  H01M4/136 ,  H01M4/045 ,  H01M4/50 ,  H01M8/0245 ,  H01M4/388 ,  H01M2300/0034 ,  H01M2004/028

Abstract: Systems, articles, and methods generally related to the electrochemical formation of layers comprising halogen ions on substrates are described.

公开(公告)号：US11791454B2

公开(公告)日：2023-10-17

申请号：US16909630

申请日：2020-06-23

Applicant: Massachusetts Institute of Technology

Inventor： Betar Gallant ,  Haining Gao

IPC: H01M4/1397 ,  H01M4/04 ,  H01M4/136 ,  H01M4/50 ,  H01M8/0245 ,  H01M4/38 ,  H01M4/02

CPC classification number: H01M4/1397 ,  H01M4/0402 ,  H01M4/045 ,  H01M4/136 ,  H01M4/388 ,  H01M4/50 ,  H01M8/0245 ,  H01M2004/028 ,  H01M2300/0034

Abstract: Systems, articles, and methods generally related to the electrochemical formation of layers comprising halogen ions on substrates are described.

公开(公告)号：US20220367884A1

公开(公告)日：2022-11-17

申请号：US17679014

申请日：2022-02-23

Applicant: Massachusetts Institute of Technology

Inventor： Betar Gallant ,  Timothy Manning Swager ,  Kosuke Yoshinaga ,  Haining Gao

IPC: H01M6/16 ,  H01M4/38 ,  H01M4/583 ,  H01M10/0567

Abstract: Systems, articles, and methods directed to electrochemical systems (e.g., batteries) and the electrochemical reduction of halogenated compounds are generally described. In certain embodiments, the halogenated compound comprises a haloalkane associated with a conjugated system via at least one alkene linker or alkyne linker.

公开(公告)号：US20210057723A1

公开(公告)日：2021-02-25

申请号：US16909630

申请日：2020-06-23

Applicant: Massachusetts Institute of Technology

Inventor： Betar Gallant ,  Haining Gao

IPC: H01M4/1397 ,  H01M4/04 ,  H01M4/136 ,  H01M4/38 ,  H01M4/50 ,  H01M8/0245

Abstract: Systems, articles, and methods generally related to the electrochemical formation of layers comprising halogen ions on substrates are described.

公开(公告)号：US12294076B2

公开(公告)日：2025-05-06

申请号：US18457214

申请日：2023-08-28

Applicant: Massachusetts Institute of Technology

Inventor： Betar Gallant ,  Haining Gao

IPC: H01M4/1397 ,  H01M4/02 ,  H01M4/04 ,  H01M4/136 ,  H01M4/38 ,  H01M4/50 ,  H01M8/0245

Abstract: Systems, articles, and methods generally related to the electrochemical formation of layers comprising halogen ions on substrates are described.

公开(公告)号：US20220367885A1

公开(公告)日：2022-11-17

申请号：US17679031

申请日：2022-02-23

Applicant: Massachusetts Institute of Technology

Inventor： Betar Gallant ,  Haining Gao

IPC: H01M6/16 ,  H01M4/134 ,  H01M4/133 ,  H01M10/0567

Abstract: Systems, articles, and methods directed to electrochemical systems (e.g., batteries) and the electrochemical reduction of halogenated compounds are generally described. In certain embodiments, the halogenated compound comprises at least one sulfur pentahalide (e.g., pentafluoride) group associated with a conjugated system.